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Description
  • Stoichiometric and partially reduced ceria films were deposited on preoxidized Ru(0001) crystal by Ce evaporation in oxygen atmosphere of different pressures at 700 K. Copper-ceria interaction was investigated by deposition of metalic copper on both types of substrate. The samples were characterized by low energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) of core states and resonant photoelectron spectroscopy (RPES) of the valence bands. Copper adsorption on stoichiometric ceria caused reduction of CeO2, while on the oxygen-defficient ceria it partially reoxidized the substrate. This is in agreement with DFT+U calculations of copper adsorption on stoichiometric and defective ceria surfaces.
  • Stoichiometric and partially reduced ceria films were deposited on preoxidized Ru(0001) crystal by Ce evaporation in oxygen atmosphere of different pressures at 700 K. Copper-ceria interaction was investigated by deposition of metalic copper on both types of substrate. The samples were characterized by low energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) of core states and resonant photoelectron spectroscopy (RPES) of the valence bands. Copper adsorption on stoichiometric ceria caused reduction of CeO2, while on the oxygen-defficient ceria it partially reoxidized the substrate. This is in agreement with DFT+U calculations of copper adsorption on stoichiometric and defective ceria surfaces. (en)
Title
  • Copper-ceria interaction: A combined photoemission and DFT study
  • Copper-ceria interaction: A combined photoemission and DFT study (en)
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  • Copper-ceria interaction: A combined photoemission and DFT study
  • Copper-ceria interaction: A combined photoemission and DFT study (en)
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  • RIV/00216208:11320/13:10192083!RIV14-GA0-11320___
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  • I, P(GAP204/10/1169), P(GAP204/11/1183), P(GD202/09/H041), P(LA08022), P(LG12003), S
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  • únor
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  • 67073
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  • RIV/00216208:11320/13:10192083
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  • DFT plus U; Photoemission; Ceria; Copper (en)
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  • NL - Nizozemsko
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  • [B89929B888E3]
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  • Applied Surface Science
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  • 267
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  • Matolín, Vladimír
  • Matolínová, Iva
  • Skála, Tomáš
  • Camellone, Matteo Farnesi
  • Fabris, Stefano
  • Szabová, Lucie
http://linked.open...ain/vavai/riv/wos
  • 000314881900004
issn
  • 0169-4332
number of pages
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  • 10.1016/j.apsusc.2012.04.098
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  • 11320
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