About: Photoemission study of cerium silicate model systems

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://dx.doi.org/10.1016/j.apsusc.2012.11.126
Description	Interaction of silicon with cerium oxide was studied by photoelectron spectroscopy using two model systems CeOx/Si(1 1 1) and Si/CeO2(1 1 1)/Cu(1 1 1) which can be used for fundamental studies in the field of microelectronics and heterogeneous catalysis. The interaction was found to be strong and lead to a formation of cerium silicate films of the proposed stoichiometry Ce4.67Si3O13. Their maximum thickness was limited by diffusion of silicon. Beside silicate other compounds were growing on the surface - SiO2, Si2O, Si, and CeO2. The assignment of the formed species is based on the interpretation of photoemission spectra involving the measurements of various reference O/Si and Si-O/Cu systems. Interaction of silicon with cerium oxide was studied by photoelectron spectroscopy using two model systems CeOx/Si(1 1 1) and Si/CeO2(1 1 1)/Cu(1 1 1) which can be used for fundamental studies in the field of microelectronics and heterogeneous catalysis. The interaction was found to be strong and lead to a formation of cerium silicate films of the proposed stoichiometry Ce4.67Si3O13. Their maximum thickness was limited by diffusion of silicon. Beside silicate other compounds were growing on the surface - SiO2, Si2O, Si, and CeO2. The assignment of the formed species is based on the interpretation of photoemission spectra involving the measurements of various reference O/Si and Si-O/Cu systems. (en)
Title	Photoemission study of cerium silicate model systems Photoemission study of cerium silicate model systems (en)
skos:prefLabel	Photoemission study of cerium silicate model systems Photoemission study of cerium silicate model systems (en)
skos:notation	RIV/00216208:11320/13:10192071!RIV14-MSM-11320___
http://linked.open...avai/predkladatel	Matematicko-fyzikální fakulta
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(LA08022), P(LD11047), P(LG12003)
http://linked.open...iv/cisloPeriodika	leden
http://linked.open...vai/riv/dodaniDat	2014
http://linked.open...aciTvurceVysledku	Matolín, Vladimír Skála, Tomáš
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	96096
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/13:10192071
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Photoelectron spectroscopy; Thin layer growth; Cerium silicate; Silicon; Cerium oxide (en)
http://linked.open.../riv/klicoveSlovo	Cerium silicate Silicon Cerium oxide Photoelectron spectroscopy Thin layer growth
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[3852AE0DBFF3]
http://linked.open...i/riv/nazevZdroje	Applied Surface Science
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...vavai/riv/projekt	Materials science beamline at synchrotron Elettra in Trieste Participation of Czech scientists in synchrotron radiation experiments at Elettra Model Systems of Nanostructured Bimetallic Materials for Enviromental Applications
http://linked.open...UplatneniVysledku	2013
http://linked.open...v/svazekPeriodika	265
http://linked.open...iv/tvurceVysledku	Matolín, Vladimír Skála, Tomáš
http://linked.open...ain/vavai/riv/wos	000312958500126
issn	0169-4332
number of pages	6 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.apsusc.2012.11.126
http://localhost/t...ganizacniJednotka	11320

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