Attributes | Values |
---|
rdf:type
| |
rdfs:seeAlso
| |
Description
| - Two-step process that allows controlling independently roughness and chemical composition of plasma polymers, i.e., two parameters determining the wettability of such materials, is presented. In the first step a film composed of Ti nano-clusters is deposited on a smooth substrate. Nano-cluster films of different roughness can be obtained depending on deposition time. In the second step the nano-cluster films are overlaid by a thin layer of plasma polymer having the desired chemical structure. This approach allows the tuning of wettability of the deposited films to as much as 50% of the wettability of the films having the same chemical structure but deposited on a smooth substrate.
- Two-step process that allows controlling independently roughness and chemical composition of plasma polymers, i.e., two parameters determining the wettability of such materials, is presented. In the first step a film composed of Ti nano-clusters is deposited on a smooth substrate. Nano-cluster films of different roughness can be obtained depending on deposition time. In the second step the nano-cluster films are overlaid by a thin layer of plasma polymer having the desired chemical structure. This approach allows the tuning of wettability of the deposited films to as much as 50% of the wettability of the films having the same chemical structure but deposited on a smooth substrate. (en)
|
Title
| - Control of Wettability of Plasma Polymers by Application of Ti Nano-Clusters
- Control of Wettability of Plasma Polymers by Application of Ti Nano-Clusters (en)
|
skos:prefLabel
| - Control of Wettability of Plasma Polymers by Application of Ti Nano-Clusters
- Control of Wettability of Plasma Polymers by Application of Ti Nano-Clusters (en)
|
skos:notation
| - RIV/00216208:11320/12:10124775!RIV13-AV0-11320___
|
http://linked.open...avai/predkladatel
| |
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| - P(KAN101120701), P(LD11032), S, Z(MSM0021620834)
|
http://linked.open...iv/cisloPeriodika
| |
http://linked.open...vai/riv/dodaniDat
| |
http://linked.open...aciTvurceVysledku
| |
http://linked.open.../riv/druhVysledku
| |
http://linked.open...iv/duvernostUdaju
| |
http://linked.open...titaPredkladatele
| |
http://linked.open...dnocenehoVysledku
| |
http://linked.open...ai/riv/idVysledku
| - RIV/00216208:11320/12:10124775
|
http://linked.open...riv/jazykVysledku
| |
http://linked.open.../riv/klicovaSlova
| - wettability; surface roughness; plasma polymers; nanostructures; gas aggregation cluster sources (en)
|
http://linked.open.../riv/klicoveSlovo
| |
http://linked.open...odStatuVydavatele
| - DE - Spolková republika Německo
|
http://linked.open...ontrolniKodProRIV
| |
http://linked.open...i/riv/nazevZdroje
| - PLASMA PROCESSES AND POLYMERS
|
http://linked.open...in/vavai/riv/obor
| |
http://linked.open...ichTvurcuVysledku
| |
http://linked.open...cetTvurcuVysledku
| |
http://linked.open...vavai/riv/projekt
| |
http://linked.open...UplatneniVysledku
| |
http://linked.open...v/svazekPeriodika
| |
http://linked.open...iv/tvurceVysledku
| - Kratochvíl, Jiří
- Kylián, Ondřej
- Artemenko, Anna
- Biederman, Hynek
- Drábik, Martin
- Polonskyi, Oleksandr
- Shukurov, Andrey
- Slavínská, Danka
- Solař, Pavel
|
http://linked.open...ain/vavai/riv/wos
| |
http://linked.open...n/vavai/riv/zamer
| |
issn
| |
number of pages
| |
http://bibframe.org/vocab/doi
| |
http://localhost/t...ganizacniJednotka
| |
is http://linked.open...avai/riv/vysledek
of | |