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  • Iodine-containing polishing etchants were tested on CdTe and CdZnTe surfaces with different orientations. The nature of the chemical dissolution of CdTe with (111)A, (111)B, (110), and (100) orientations in the I2-methanol solution was studied. It was established that this dissolution is diffusion controlled. The study of the chemical composition and structure of the (211)B CdZnTe surfaces etched under different conditions was carried out. X-ray photoelectron spectroscopy (XPS) measurements showed that a stoichiometric surface was achieved after short heating of the etched surface in vacuum.
  • Iodine-containing polishing etchants were tested on CdTe and CdZnTe surfaces with different orientations. The nature of the chemical dissolution of CdTe with (111)A, (111)B, (110), and (100) orientations in the I2-methanol solution was studied. It was established that this dissolution is diffusion controlled. The study of the chemical composition and structure of the (211)B CdZnTe surfaces etched under different conditions was carried out. X-ray photoelectron spectroscopy (XPS) measurements showed that a stoichiometric surface was achieved after short heating of the etched surface in vacuum. (en)
Title
  • Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions
  • Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions (en)
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  • Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions
  • Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions (en)
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  • RIV/00216208:11320/11:10106112!RIV12-MSM-11320___
http://linked.open...avai/predkladatel
http://linked.open...avai/riv/aktivita
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  • Z(MSM0021620834)
http://linked.open...iv/cisloPeriodika
  • 8
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 190123
http://linked.open...ai/riv/idVysledku
  • RIV/00216208:11320/11:10106112
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • RHEED; XPS; chemical etching; CdZnTe; CdTe (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [8C5E9F549E64]
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  • Journal of Electronic Materials
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http://linked.open...v/svazekPeriodika
  • 40
http://linked.open...iv/tvurceVysledku
  • Chukhnenko, P. S.
  • Franc, Jan
  • Höschl, Pavel
  • Ivanits'ka, V. G.
  • Mašek, Karel
  • Moravec, Pavel
  • Tomashik, V. M.
  • Tomashik, Z.F.
  • Ulrych, Jan
http://linked.open...ain/vavai/riv/wos
  • 000292466000032
http://linked.open...n/vavai/riv/zamer
issn
  • 0361-5235
number of pages
http://bibframe.org/vocab/doi
  • 10.1007/s11664-011-1649-2
http://localhost/t...ganizacniJednotka
  • 11320
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