About: Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Titanium dioxide films have many remarkable properties, for example photocatalytic activity and hydrophilicity. However, these properties depend significantly on the crystallinity, phase composition and microstructure of the films. In this study, crystallization of amorphous films with different thickness (50-2000 nm) deposited on silicon substrates was investigated by XRD in-situ isochronal and isothermal annealing at different temperatures and compared with the post-annealing of both amorphous and nanocrystalline films. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thin films. The process can be well described by the Avrami equation modified by the initial time of crystallization. The parameters of the equation depend on the film thickness. Titanium dioxide films have many remarkable properties, for example photocatalytic activity and hydrophilicity. However, these properties depend significantly on the crystallinity, phase composition and microstructure of the films. In this study, crystallization of amorphous films with different thickness (50-2000 nm) deposited on silicon substrates was investigated by XRD in-situ isochronal and isothermal annealing at different temperatures and compared with the post-annealing of both amorphous and nanocrystalline films. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thin films. The process can be well described by the Avrami equation modified by the initial time of crystallization. The parameters of the equation depend on the film thickness. (en)
Title	Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films (en)
skos:prefLabel	Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films (en)
skos:notation	RIV/00216208:11320/09:00206793!RIV10-GA0-11320___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA106/06/0327), Z(MSM0021620834)
http://linked.open...iv/cisloPeriodika	neuveden
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Matěj, Zdeněk Kužel, Radomír Nichtová, Lea
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	346339
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/09:00206793
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	thickness; dependence; crystallization; amorphous; magnetron; deposited; films (en)
http://linked.open.../riv/klicoveSlovo	crystallization films amorphous magnetron thickness dependence deposited
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[5B0533374FB8]
http://linked.open...i/riv/nazevZdroje	Zeitschrift für Kristallographie
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Crystallization of amorphous and nanocrystalline thin films
http://linked.open...UplatneniVysledku	2009
http://linked.open...v/svazekPeriodika	Neuveden
http://linked.open...iv/tvurceVysledku	Matěj, Zdeněk Kužel, Radomír Musil, J. Nichtová, Lea Sicha, J.
http://linked.open...ain/vavai/riv/wos	000271325700003
http://linked.open...n/vavai/riv/zamer	Condensed Matter Physics – New Materials and Technologies
issn	0044-2968
number of pages	6 (xsd:int)
http://localhost/t...ganizacniJednotka	11320
is http://linked.open...avai/riv/vysledek of	Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films

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