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  • The goal of the project is the explanation of the microscopic mechanism of slow-ion-induced kinetic electron emission from solid surfaces - a problem that has not been satistactirily solved yet. To that end we will perform new experiments at UJEP in Ústí nad Labem and use our latest theoretical results at ÚFE AV ČR. At UJEP we will obtain high quality experimental data of the total electron yields and electron energy distributions from metals (W, Ru) and semiconductors (Si) bombarded by slow Cs+ ions. We will compare these data with the complementary experiments at IAP TU Vienna and we will inerpret them within the theoretical models developed within our collaboration with the Austrian colleagues. (en)
  • Navržení mikroskopického mechanizmu emise elektronů z kovů a polovodičů s pomocí nových experimentů v České republice a v koordinaci se spolupracujícím pracovištěm na IAP TU Wien.
Title
  • Kinetic electron emission from metals induced by impact of slow ions (en)
  • Kinetická elektronová emise z kovů a polovodičů způsobená dopadem pomalých iontů
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  • ME10086
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  • ion induced kinetic electron emission tungsten silicon (en)
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  • Project ME10086 allowed gathering data on the bombing of the yield of secondary Cu, Au, Ru and Si at different currents bombing Cs ions with energies from 30eV to 1 keV. The data obtained is used to verify existing theories of this issue, and especially to its specification listed in published scientific articles. This theory is important for all applications using electron emission by ion impact. (en)
  • Projekt ME10086 umožnil získání dat o výtěžku sekundárních při bombardování Cu, Au, Ru a Si při různých bombardovacích proudech ionty Cs s energie od 30eV do 1 keV . Získaná data slouží k ověření existující teorie této emise a hlavně k jejímu zpřesnění uvedené v publikovaných vědeckých článcích. Tato teorie je důležitá pro všechny aplikace využívající sekundární emisi elektronů po dopadu iontu. (cs)
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