About: Novel plasma sources for film deposition and surface modification

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Projekt, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	http://linked.opendata.cz/ontology/domain/vavai/Projekt
Description	Cílem projektu je objasnění fyzikální podstaty činnosti tří nových magnetronových systémů pro rychlou depozici vrstev a pulzní magnetronové depozice vrstev na bázi uhlíku a nových vrstev Si-B-C-N s mimořádně vysokou teplotní stabilitou. (cs) The project is aimed at plasma technologies with a high application potential. Research will be mainly focused on fundamental aspects of magnetron operation in three novel high-power pulsed systems. They will be used for high-rate deposition of carbon-based films, various oxide and nitride films and for deposition of high-temperature Si-B-C-N films. (en)
Title	Nové plazmové zdroje pro depozici vrstev a modifikaci povrchů (cs) Novel plasma sources for film deposition and surface modification (en)
http://linked.open...vai/cislo-smlouvy	http://linked.opendata.cz/resource/domain/vavai/cep/smlouva/1081/2011-320
http://linked.open...lsi-vedlejsi-obor	http://linked.opendata.cz/resource/domain/vavai/cep/obor/JJ
http://linked.open...avai/druh-souteze	http://linked.opendata.cz/resource/domain/vavai/cep/druh-souteze/VS
http://linked.open...domain/vavai/faze	http://linked.opendata.cz/resource/domain/vavai/cep/faze/54688007
http://linked.open...vavai/hlavni-obor	http://linked.opendata.cz/resource/domain/vavai/cep/obor/BL
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http://linked.open...vavai/id-aktivity	http://linked.opendata.cz/resource/domain/vavai/cep/aktivita/OC
http://linked.open.../vavai/id-souteze	http://linked.opendata.cz/resource/domain/vavai/cep/soutez/SMSM2010OC5
http://linked.open...n/vavai/kategorie	http://linked.opendata.cz/resource/domain/vavai/cep/kategorie/1
http://linked.open...vai/klicova-slova	Novel plasma sources; film deposition and surface modification; magnetron sputtering; high-power pulsed systems; carbon-based films; oxides and nitrides; high-temperature Si-B-C-N materials. (en)
http://linked.open...avai/konec-reseni	2012-12-31 (xsd:date)
http://linked.open...nujicich-prijemcu	0 (xsd:integer)
http://linked.open...avai/poskytovatel	http://linked.opendata.cz/resource/domain/vavai/cep/poskytovatel/MSM
http://linked.open...avai/start-reseni	2010-05-01 (xsd:date)
http://linked.open...ai/statni-podpora	991 (xsd:integer)
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http://linked.open...ku-zverejnovanych	11 (xsd:integer)
is http://linked.open...ain/vavai/projekt of	http://linked.opendata.cz/resource/domain/vavai/cep/ucast/2010/OC10045/orjk-23520 http://linked.opendata.cz/resource/domain/vavai/cep/ucast/2011/OC10045/orjk-23520 http://linked.opendata.cz/resource/domain/vavai/cep/ucast/2012/OC10045/orjk-23520 http://linked.opendata.cz/resource/domain/vavai/cep/ucast/2013/OC10045/orjk-23520

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