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Description
| - Cílem projektu bude využití několika diagnostických metod plazmatu (Langmuirova sonda, kalorimetrická sonda, energetický analyzátor iontu, laserova absorpční spektroskopie, optická emisní spektroskopie) za účelem srovnávacího výzkumu vlastností technologických plazmatických depozičních systémů. (cs)
- The essence of suggested project is a purposeful investigation of plasma parameters in the low-pressure technological plasma reactors utilized for deposition of thin films. In the present time, there are several wholly different plasma sources - a planar magnetron, a plasma jet with hollow cathode, a microwave surfatron - dedicated for preparation of specific thin films and coatings, which are successfully used in the division of Optics of the Institute of Physics of the AS CR for deposition of thin films of perovskite oxides (STO, BTO, BSTO, PZT), TiOx, piezoelectric ZnO etc. on substrates made of various materials, e.g. polymers. A previous research showed that properties of thin films could be radically different if prepared by means of above mentioned plasma deposition systems. Therefore, it is desirable to investigate in detail attributes of these discharges and to carry out a basic comparative study of the plasma parameters, total energy flux density on a substrate and the properties of deposited thin films among these plasma sources. Then acquired knowledge should enable us partly to understand plasma properties of different plasma sources and to optimize the deposition process in the better way for concrete thin films by choosing of appropriate plasma source or their mutual combination. (en)
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Title
| - Výzkum parametrů nízkoteplotního plazmatu v systémech planárního magnetronu, systémů s dutými katodami a mikrovlnného surfatronu (cs)
- An investigation of low-temperature plasma in systems of a planar magnetron, in systems with hollow cathodes and a microwave surfatron (en)
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http://linked.open...vai/cislo-smlouvy
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http://linked.open...avai/druh-souteze
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http://linked.open...domain/vavai/faze
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http://linked.open...vavai/hlavni-obor
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http://linked.open...vavai/id-aktivity
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http://linked.open.../vavai/id-souteze
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http://linked.open...n/vavai/kategorie
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http://linked.open...vai/klicova-slova
| - magnetron; dutá katoda; surfatron; plazmový kanál; pulzně generovaný výboj; tenké vrstvy; technologie (en)
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http://linked.open...avai/konec-reseni
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http://linked.open...nujicich-prijemcu
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http://linked.open...avai/poskytovatel
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http://linked.open...avai/start-reseni
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http://linked.open...ai/statni-podpora
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http://linked.open...vavai/typProjektu
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http://linked.open...ai/uznane-naklady
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http://linked.open...ai/pocet-prijemcu
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http://linked.open...cet-spoluprijemcu
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http://linked.open...ai/pocet-vysledku
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http://linked.open...ku-zverejnovanych
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is http://linked.open...ain/vavai/projekt
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