The paper deals with synthesis of novel defects in silicon by ion irradiation for future application in semiconductor technology: low-temperature formation of deep donor layers.
The paper deals with synthesis of novel defects in silicon by ion irradiation for future application in semiconductor technology: low-temperature formation of deep donor layers. (en)
Synthesis of novel defects in silicon by ion irradiation for future application in semiconductor technology: low-temperature formation of deep donor layers
Synthesis of novel defects in silicon by ion irradiation for future application in semiconductor technology: low-temperature formation of deep donor layers (en)
Synthesis of novel defects in silicon by ion irradiation for future application in semiconductor technology: low-temperature formation of deep donor layers
Synthesis of novel defects in silicon by ion irradiation for future application in semiconductor technology: low-temperature formation of deep donor layers (en)