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  • There was studied the process of water and selected organic liquids adhesion on the surface of epitaxial Si and pyrolytic SiO2 in the temperature range from 20 to 50 oC. The values of dispersion sd(s) and polar sp(s) components of the density of the surface Gibbs energy s(s) of Si and SiO2 layers were determined by the method based on measuring the angle of wetting j. It has been found that the polar component of interaction regulates the density of the surface Gibbs energy of the above substrates.
  • There was studied the process of water and selected organic liquids adhesion on the surface of epitaxial Si and pyrolytic SiO2 in the temperature range from 20 to 50 oC. The values of dispersion sd(s) and polar sp(s) components of the density of the surface Gibbs energy s(s) of Si and SiO2 layers were determined by the method based on measuring the angle of wetting j. It has been found that the polar component of interaction regulates the density of the surface Gibbs energy of the above substrates. (en)
Title
  • Wetting of Si and SiO2 Thin Layer
  • Wetting of Si and SiO2 Thin Layer (en)
skos:prefLabel
  • Wetting of Si and SiO2 Thin Layer
  • Wetting of Si and SiO2 Thin Layer (en)
skos:notation
  • RIV/70883521:28110/02:63500502!RIV/2003/MSM/281103/N
http://linked.open.../vavai/riv/strany
  • 46-50
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  • Z(MSM 265200015)
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  • 670739
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  • RIV/70883521:28110/02:63500502
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  • wetting of Si and SiO2, Gibbs surface energy, wetting angle (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [DBF5A9640E39]
http://linked.open...v/mistoKonaniAkce
  • Rožnov pod Radhoštěm
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  • Rožnov pod Radhoštěm
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  • Silicon 2002, The 8th scientific and Business Conference
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  • Lapčík, Lubomír
  • Lapčíková, Barbora
  • Tomeček, Petr
  • Macháčková, Alena
  • Lichovník, Ladislav
  • Fekete, Stanislav
  • Hrivnáková, Věra
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http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
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  • TECON Scientific, s.r.o.
http://localhost/t...ganizacniJednotka
  • 28110
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