About: Thin Oxide Films Prepared by Laser-Assisted Metal-Organic CVD: Structural and Gas Sensing Properties

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About: Thin Oxide Films Prepared by Laser-Assisted Metal-Organic CVD: Structural and Gas Sensing Properties Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Amorphous and polycrystalline tin oxide (SnOx) thin films were grown by ArF excimer laser-induced metal-organic chemical vapour deposition (L-MOCVD) from tetramethyltin (TMT) and oxygen as precursors. The films structure and composition were investigated by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The deposition temperature and the ratio of the TMT and oxygen flow rates have been optimised in order to minimise the residual carbon content and to achieve stoichiometric SnO2 films. The films deposited at room temperature were amorphous, strongly substoichiometric [O]:[Sn] = 1.3 and with a high residual carbon content depending on the TMT and oxygen ratio. Films grown at 300 °C were polycrystalline with [O]:[Sn] ratios up to 1.8 and with a much lower carbon content. The tin oxide films were subsequently used as sensing layers for gas detection. A satisfactory sensor performance was obtained for the oxidising NO2 and the reducing N2O, CH4, SO2, CO, CO2, H2 gases. Amorphous and polycrystalline tin oxide (SnOx) thin films were grown by ArF excimer laser-induced metal-organic chemical vapour deposition (L-MOCVD) from tetramethyltin (TMT) and oxygen as precursors. The films structure and composition were investigated by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The deposition temperature and the ratio of the TMT and oxygen flow rates have been optimised in order to minimise the residual carbon content and to achieve stoichiometric SnO2 films. The films deposited at room temperature were amorphous, strongly substoichiometric [O]:[Sn] = 1.3 and with a high residual carbon content depending on the TMT and oxygen ratio. Films grown at 300 °C were polycrystalline with [O]:[Sn] ratios up to 1.8 and with a much lower carbon content. The tin oxide films were subsequently used as sensing layers for gas detection. A satisfactory sensor performance was obtained for the oxidising NO2 and the reducing N2O, CH4, SO2, CO, CO2, H2 gases. (en)
Title	Thin Oxide Films Prepared by Laser-Assisted Metal-Organic CVD: Structural and Gas Sensing Properties Thin Oxide Films Prepared by Laser-Assisted Metal-Organic CVD: Structural and Gas Sensing Properties (en)
skos:prefLabel	Thin Oxide Films Prepared by Laser-Assisted Metal-Organic CVD: Structural and Gas Sensing Properties Thin Oxide Films Prepared by Laser-Assisted Metal-Organic CVD: Structural and Gas Sensing Properties (en)
skos:notation	RIV/68407700:21460/05:00113051!RIV10-MSM-21460___
http://linked.open...avai/riv/aktivita	V
http://linked.open...avai/riv/aktivity	V
http://linked.open...iv/cisloPeriodika	1-4
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Jelínek, Miroslav
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta biomedicínského inženýrství
http://linked.open...dnocenehoVysledku	546744
http://linked.open...ai/riv/idVysledku	RIV/68407700:21460/05:00113051
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	L-MOCVD; X-ray diffraction; TMT; SnOx (en)
http://linked.open.../riv/klicoveSlovo	TMT X-ray diffraction L-MOCVD SnOx
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[08DA6188CD42]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BH
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...UplatneniVysledku	2005
http://linked.open...v/svazekPeriodika	200
http://linked.open...iv/tvurceVysledku	Jelínek, Miroslav
http://linked.open...ain/vavai/riv/wos	000232327800233
issn	0257-8972
number of pages	4 (xsd:int)
http://localhost/t...ganizacniJednotka	21460

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