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Description
| - Various techniques were used for the preparation of titanium (IV) oxide nanoscaled thin films. The deposition of the layers was carried out in the environment of chemically active plasma due to the utilization of plasma assisted devices including PVD hollow cathode plasma jet sputtering system, PVD magnetron sputtering and PECVD technique using surfatron produced plasma discharge as a jet type. The sol-gel process realized in the reverse micelle environment was chosen as a purely chemical procedure. All layers were tested then for their photo-induced electrochemical properties based on evaluation of polarization curves and corresponding photocurrents.
- Various techniques were used for the preparation of titanium (IV) oxide nanoscaled thin films. The deposition of the layers was carried out in the environment of chemically active plasma due to the utilization of plasma assisted devices including PVD hollow cathode plasma jet sputtering system, PVD magnetron sputtering and PECVD technique using surfatron produced plasma discharge as a jet type. The sol-gel process realized in the reverse micelle environment was chosen as a purely chemical procedure. All layers were tested then for their photo-induced electrochemical properties based on evaluation of polarization curves and corresponding photocurrents. (en)
- Vrstvy TiO2 byly připravovány několika různými postupy. Jednalo se o plazmachemické metody depozice (magnetronové naprašování, surfatron, DC pulzní výboj v duté katodě). Zcela odlišnou techniku přípravy vrstev představovala chemická metoda sol-gel, probíhající v prostředí tzv. inverzních micel. Připravené vrstvy byly srovnávány z hlediska jejich fotoindukovatelných vlastností pomocí elektrochemických experimentů. (cs)
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Title
| - Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films
- Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films (en)
- Plazmová depozice a fotoelektrochemické vlastnosti TiO2 (cs)
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skos:prefLabel
| - Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films
- Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films (en)
- Plazmová depozice a fotoelektrochemické vlastnosti TiO2 (cs)
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skos:notation
| - RIV/68407700:21340/08:04152942!RIV09-MSM-21340___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68407700:21340/08:04152942
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - TiO2; Thin films; Magnetron sputtering; Surfatron; DC hollow cathode; Sol-gePhotocurrents; IPCE (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...v/mistoKonaniAkce
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http://linked.open...i/riv/mistoVydani
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http://linked.open...i/riv/nazevZdroje
| - Recent advances in photochemistry, electrochemistry and photocatalysts - Proceedings of workshop
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Kment, Štěpán
- Krýsa, J.
- Straňák, V.
- Čada, M.
- Klusoň, P.
- Virostko, P.
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http://linked.open...vavai/riv/typAkce
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http://linked.open.../riv/zahajeniAkce
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http://linked.open...n/vavai/riv/zamer
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number of pages
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http://purl.org/ne...btex#hasPublisher
| - Vydavatelství VŠCHT Praha
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https://schema.org/isbn
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http://localhost/t...ganizacniJednotka
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