| Attributes | Values |
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| rdf:type
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| Description
| - Low pressure hollow cathode plasma jet system was used for deposition of LixZnyO thin films. Hollow cathode discharge was excited by either CW or pulse modulated RF power. Reactive sputtering of composed hollow cathode in Ar and O2 was used for that purpose. One part of the nozzle was made of sintered Li2ZnO2 and the second one of pure metallic zinc. Chemical composition of deposited films was determined by atomic absorption spectroscopy. It was found that the ratio of Li and Zn atoms in the films was possible to change from 0.04 to 1.41 and it was dependent on the deposition conditions. Structure and orientation of crystallites were checked by XRD in Bragg-Brentano geometry. Hexagonal structure of ZnO crystallites was identified in deposited films. Basically, the plane 001 had preferred orientation parallel to the substrate surface. Photoluminescence was studied on the deposited samples as well.
- Low pressure hollow cathode plasma jet system was used for deposition of LixZnyO thin films. Hollow cathode discharge was excited by either CW or pulse modulated RF power. Reactive sputtering of composed hollow cathode in Ar and O2 was used for that purpose. One part of the nozzle was made of sintered Li2ZnO2 and the second one of pure metallic zinc. Chemical composition of deposited films was determined by atomic absorption spectroscopy. It was found that the ratio of Li and Zn atoms in the films was possible to change from 0.04 to 1.41 and it was dependent on the deposition conditions. Structure and orientation of crystallites were checked by XRD in Bragg-Brentano geometry. Hexagonal structure of ZnO crystallites was identified in deposited films. Basically, the plane 001 had preferred orientation parallel to the substrate surface. Photoluminescence was studied on the deposited samples as well. (en)
- Nízkotlaká plasmová tryska s dutou katodou byla použita k depozici tenkých vrstev LixZnyO. Výboj v duté katodě byl buzen buď kontinuálním nebo pulzně modulovaným vysokofrekvenčním zdrojem. Jedna část trysky byla vyrobena ze spékaného Li2ZnO2 a druhá z čistého kovového zinku. Chemické složení deponovaných vrstev bylo stanoveno atomovou absorpční spektroskopií. Poměr Li a Zn atomů ve vrstvách bylo možno měnit od 0,04 do 1,41 v závislosti na podmínkách depozice. Struktura a orientace krystalitů byly určeny pomocí rentgenové difrakce v Bragg-Brentano geometrii. U deponovaných vrstev byla zjištěna hexagonální struktura krystalitů ZnO s přednostní orientací 001 rovin rovnoběžně s povrchem substrátu. Rovněž byla studována fotoluminiscence deponovaných vrstev. (cs)
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| Title
| - Nízkotlaká depozice tenkých vrstev LixZnyO pomocí vysokofrekvenční plasmové trysky (cs)
- Low Pressure Deposition of LixZnyO Thin Films by Means of RF Plasma Jet System
- Low Pressure Deposition of LixZnyO Thin Films by Means of RF Plasma Jet System (en)
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| skos:prefLabel
| - Nízkotlaká depozice tenkých vrstev LixZnyO pomocí vysokofrekvenční plasmové trysky (cs)
- Low Pressure Deposition of LixZnyO Thin Films by Means of RF Plasma Jet System
- Low Pressure Deposition of LixZnyO Thin Films by Means of RF Plasma Jet System (en)
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| skos:notation
| - RIV/68407700:21340/04:04106478!RIV/2005/MSM/213405/N
|
| http://linked.open.../vavai/riv/strany
| |
| http://linked.open...avai/riv/aktivita
| |
| http://linked.open...avai/riv/aktivity
| - Z(MSM 113200002), Z(MSM 210000021)
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| http://linked.open...iv/cisloPeriodika
| |
| http://linked.open...vai/riv/dodaniDat
| |
| http://linked.open...aciTvurceVysledku
| |
| http://linked.open.../riv/druhVysledku
| |
| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
| |
| http://linked.open...ai/riv/idVysledku
| - RIV/68407700:21340/04:04106478
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| http://linked.open...riv/jazykVysledku
| |
| http://linked.open.../riv/klicovaSlova
| - chemical composition; emission spectroscopy; photoluminescence (en)
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| http://linked.open.../riv/klicoveSlovo
| |
| http://linked.open...odStatuVydavatele
| - CH - Švýcarská konfederace
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| http://linked.open...ontrolniKodProRIV
| |
| http://linked.open...i/riv/nazevZdroje
| |
| http://linked.open...in/vavai/riv/obor
| |
| http://linked.open...ichTvurcuVysledku
| |
| http://linked.open...cetTvurcuVysledku
| |
| http://linked.open...UplatneniVysledku
| |
| http://linked.open...v/svazekPeriodika
| |
| http://linked.open...iv/tvurceVysledku
| - Jastrabík, L.
- Potůček, Zdeněk
- Ptáček, Pavel
- Hubička, Z.
- Čada, M.
- Šíchová, H.
- Málková, Z.
- Trunda, B.
|
| http://linked.open...n/vavai/riv/zamer
| |
| issn
| |
| number of pages
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| http://localhost/t...ganizacniJednotka
| |
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