About: Study of the Cathode Potential in a Sputtering Discharge by Pulsing the Reactive Gas: Case of a W Target in an Ar-O2 Atmosphere     Goto   Sponge   NotDistinct   Permalink

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  • The process we used was d.c. magnetron sputtering, and we studied both the conventional process, using a constant flow of oxygen, and the process in which we pulsed the reactive gas. Square regulation signal with different pulsing periods (T) and oxygen injection time (ton) was used in the reactive gas pulsing (RGP), while the partial argon pressure was kept constant for all depositions.
  • The process we used was d.c. magnetron sputtering, and we studied both the conventional process, using a constant flow of oxygen, and the process in which we pulsed the reactive gas. Square regulation signal with different pulsing periods (T) and oxygen injection time (ton) was used in the reactive gas pulsing (RGP), while the partial argon pressure was kept constant for all depositions. (en)
  • Studium katodového napětí při naprašování s pulzováním kyslíku. (cs)
Title
  • Study of the Cathode Potential in a Sputtering Discharge by Pulsing the Reactive Gas: Case of a W Target in an Ar-O2 Atmosphere
  • Studium katodového napětí při naprašování s pulzováním reaktivního plynu: W target a Ar-O2 atmosféra (cs)
  • Study of the Cathode Potential in a Sputtering Discharge by Pulsing the Reactive Gas: Case of a W Target in an Ar-O2 Atmosphere (en)
skos:prefLabel
  • Study of the Cathode Potential in a Sputtering Discharge by Pulsing the Reactive Gas: Case of a W Target in an Ar-O2 Atmosphere
  • Studium katodového napětí při naprašování s pulzováním reaktivního plynu: W target a Ar-O2 atmosféra (cs)
  • Study of the Cathode Potential in a Sputtering Discharge by Pulsing the Reactive Gas: Case of a W Target in an Ar-O2 Atmosphere (en)
skos:notation
  • RIV/68407700:21260/07:06139518!RIV08-MSM-21260___
http://linked.open.../vavai/riv/strany
  • 62;68
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM6840770038)
http://linked.open...iv/cisloPeriodika
  • 1
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 453317
http://linked.open...ai/riv/idVysledku
  • RIV/68407700:21260/07:06139518
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • coating; discharge; reactive sputtering; tungsten oxide (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [38BDE0B27EA6]
http://linked.open...i/riv/nazevZdroje
  • Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 4
http://linked.open...iv/tvurceVysledku
  • Cavaleiro, A.
  • Polcar, Tomáš
  • Parreira, N. M. G.
http://linked.open...n/vavai/riv/zamer
issn
  • 1612-8850
number of pages
http://localhost/t...ganizacniJednotka
  • 21260
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