About: Studies of hysteresis effect in reactive HiPIMS deposition of oxides

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	High power impulse magnetron sputtering (HiPIMS) has proven to be capable of substantial improvement of the quality of deposited coatings. Lately, there have been a number of reports indicating that the hysteresis effect may be reduced in HiPIMS mode resulting in an increase of the deposition rate of stoichiometric compound as compared to a direct current magnetron sputtering process in oxide mode. In this contribution, we have studied the hysteresis behaviour of Ti metal targets sputtered in Ar+O2 mixtures. For fixed pulse on time and a constant average power, there is an optimum frequency minimizing the hysteresis. The effect of gas dynamics was analyzed by measurements of the gas refill time and rarefaction. Results indicate that the gas rarefaction may be responsible for the observed hysteresis behaviour. The results are in agreement with a previous study of Al oxide reactive process. High power impulse magnetron sputtering (HiPIMS) has proven to be capable of substantial improvement of the quality of deposited coatings. Lately, there have been a number of reports indicating that the hysteresis effect may be reduced in HiPIMS mode resulting in an increase of the deposition rate of stoichiometric compound as compared to a direct current magnetron sputtering process in oxide mode. In this contribution, we have studied the hysteresis behaviour of Ti metal targets sputtered in Ar+O2 mixtures. For fixed pulse on time and a constant average power, there is an optimum frequency minimizing the hysteresis. The effect of gas dynamics was analyzed by measurements of the gas refill time and rarefaction. Results indicate that the gas rarefaction may be responsible for the observed hysteresis behaviour. The results are in agreement with a previous study of Al oxide reactive process. (en)
Title	Studies of hysteresis effect in reactive HiPIMS deposition of oxides Studies of hysteresis effect in reactive HiPIMS deposition of oxides (en)
skos:prefLabel	Studies of hysteresis effect in reactive HiPIMS deposition of oxides Studies of hysteresis effect in reactive HiPIMS deposition of oxides (en)
skos:notation	RIV/68407700:21230/11:00183741!RIV12-MSM-21230___
http://linked.open...avai/riv/aktivita	I
http://linked.open...avai/riv/aktivity	I
http://linked.open...iv/cisloPeriodika	2
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Kubart, Tomáš
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta elektrotechnická
http://linked.open...dnocenehoVysledku	232931
http://linked.open...ai/riv/idVysledku	RIV/68407700:21230/11:00183741
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Magnetron sputtering; Reactive sputtering; HiPIMS; Hysteresis; Oxides deposition (en)
http://linked.open.../riv/klicoveSlovo	Oxides deposition Magnetron sputtering HiPIMS Hysteresis Reactive sputtering
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[E268F7AEDD49]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	JI
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	205
http://linked.open...iv/tvurceVysledku	Aiempanakit, M. Helmersson, U. Kubart, Tomáš Andersson, J. Berg, S. Nyberg, T.
http://linked.open...ain/vavai/riv/wos	000293258600065
issn	0257-8972
number of pages	4 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.surfcoat.2011.01.019
http://localhost/t...ganizacniJednotka	21230

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