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Description
  • Jednoduchy model pro depozici W-O vrstev reaktivnim magnetronovym naprasovanim s pulsovanim kysliku. (cs)
  • The conventional and RGPP process parameters (target potential, total pressure and deposition rate) and the corresponding chemical composition were used to build a simple model predicting the deposition rate and the average chemical composition of the coatings deposited by RGPP as a function of the pulsing parameters. It was shown that the measured total pressure could be used to calculate the deposition rate and the chemical composition of the RGPP coatings with reasonable precision.
  • The conventional and RGPP process parameters (target potential, total pressure and deposition rate) and the corresponding chemical composition were used to build a simple model predicting the deposition rate and the average chemical composition of the coatings deposited by RGPP as a function of the pulsing parameters. It was shown that the measured total pressure could be used to calculate the deposition rate and the chemical composition of the RGPP coatings with reasonable precision. (en)
Title
  • A simple model for the deposition of W-O coatings by reactive gas pulsing process
  • A simple model for the deposition of W-O coatings by reactive gas pulsing process (en)
  • Jednoduchy model pro depozici W-O vrstev magnetronovym naprasovanim s pulzovanim reaktivniho plynu (cs)
skos:prefLabel
  • A simple model for the deposition of W-O coatings by reactive gas pulsing process
  • A simple model for the deposition of W-O coatings by reactive gas pulsing process (en)
  • Jednoduchy model pro depozici W-O vrstev magnetronovym naprasovanim s pulzovanim reaktivniho plynu (cs)
skos:notation
  • RIV/68407700:21230/08:06145482!RIV09-MSM-21230___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM6840770038)
http://linked.open...iv/cisloPeriodika
  • 3
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 354508
http://linked.open...ai/riv/idVysledku
  • RIV/68407700:21230/08:06145482
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • multilayer; reactive gas pulsing; sputtering; tungsten oxide (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • FR - Francouzská republika
http://linked.open...ontrolniKodProRIV
  • [C1532F925D41]
http://linked.open...i/riv/nazevZdroje
  • The European Physical Journal Applied Physics
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 43
http://linked.open...iv/tvurceVysledku
  • Cavaleiro, A.
  • Polcar, Tomáš
  • Carvalho, N.J.M.
  • Parreira, N. M. G.
http://linked.open...ain/vavai/riv/wos
  • 000258652300010
http://linked.open...n/vavai/riv/zamer
issn
  • 1286-0042
number of pages
http://localhost/t...ganizacniJednotka
  • 21230
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