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Description
  • Influence of precursor (titanium tetraisopropoxide (TTIP)) temperature, precursor and gas flow rates on the surface properties of TiO2 thin films deposited by atmospheric dielectric barrier discharge (ADBD) chemical vapour deposition (CVD) were investigated. Surface morphology of the thin TiO2 films deposited on glass substrates was studied by the atomic force microscopy (AFM) and water contact angle (CA) measurement.
  • Influence of precursor (titanium tetraisopropoxide (TTIP)) temperature, precursor and gas flow rates on the surface properties of TiO2 thin films deposited by atmospheric dielectric barrier discharge (ADBD) chemical vapour deposition (CVD) were investigated. Surface morphology of the thin TiO2 films deposited on glass substrates was studied by the atomic force microscopy (AFM) and water contact angle (CA) measurement. (en)
Title
  • Deposition of TiO2 Thin Films Using Atmospheric Dielectric Barrier Discharge
  • Deposition of TiO2 Thin Films Using Atmospheric Dielectric Barrier Discharge (en)
skos:prefLabel
  • Deposition of TiO2 Thin Films Using Atmospheric Dielectric Barrier Discharge
  • Deposition of TiO2 Thin Films Using Atmospheric Dielectric Barrier Discharge (en)
skos:notation
  • RIV/68407700:21230/08:00151397!RIV10-MSM-21230___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • S
http://linked.open...iv/cisloPeriodika
  • 6
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 362543
http://linked.open...ai/riv/idVysledku
  • RIV/68407700:21230/08:00151397
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • dielectric barrier discharge; atmospheric plasma; deposition; titanium dioxide thin film (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • UA - Ukrajina
http://linked.open...ontrolniKodProRIV
  • [7BF7C16E4255]
http://linked.open...i/riv/nazevZdroje
  • Problems of Atomic Science and Technology. Series: Plasma Physics
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 48
http://linked.open...iv/tvurceVysledku
  • Píchal, Jan
  • Klenko, Juliya
http://linked.open...ain/vavai/riv/wos
  • 000263031100056
issn
  • 1562-6016
number of pages
http://localhost/t...ganizacniJednotka
  • 21230
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