Pulsed laser deposition combined with additional RF and hollow cathod discharges for deposition of CNx films are studied. Films were characterized by WDX, XRD and by microhardness testers.
Pulsed laser deposition combined with additional RF and hollow cathod discharges for deposition of CNx films are studied. Films were characterized by WDX, XRD and by microhardness testers. (en)