The results of spectral and angle-dependent ellipsometric measurements of r.f. magnetron-sputtered very thin tungsten films (2/8nm) deposited onto {100} oriented silicon substrates have been reported.
The results of spectral and angle-dependent ellipsometric measurements of r.f. magnetron-sputtered very thin tungsten films (2/8nm) deposited onto {100} oriented silicon substrates have been reported. (en)