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Description
| - The metal ionized flux fraction and production of double charged metal ions Me2þ of different materials (Al, Cu, Fe, Ti) by High Power Impulse Magnetron Sputtering (HiPIMS) operated with and without a pre-ionization assistance is compared in the paper. The Electron Cyclotron Wave Resonance (ECWR) discharge was employed as the pre-ionization agent providing a seed of charge in the idle time of HiPIMS pulses. A modified grid-free biased quartz crystal microbalance was used to estimate the metal ionized flux fraction n. The energy-resolved mass spectrometry served as a complementary method to distinguish particular ion contributions to the total ionized flux onto the substrate. The ratio between densities of doubly Me2þ and singly Meþ charged metal ions was determined. It is shown that ECWR assistance enhances Me2þ production with respect of absorbed rf-power.
- The metal ionized flux fraction and production of double charged metal ions Me2þ of different materials (Al, Cu, Fe, Ti) by High Power Impulse Magnetron Sputtering (HiPIMS) operated with and without a pre-ionization assistance is compared in the paper. The Electron Cyclotron Wave Resonance (ECWR) discharge was employed as the pre-ionization agent providing a seed of charge in the idle time of HiPIMS pulses. A modified grid-free biased quartz crystal microbalance was used to estimate the metal ionized flux fraction n. The energy-resolved mass spectrometry served as a complementary method to distinguish particular ion contributions to the total ionized flux onto the substrate. The ratio between densities of doubly Me2þ and singly Meþ charged metal ions was determined. It is shown that ECWR assistance enhances Me2þ production with respect of absorbed rf-power. (en)
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Title
| - Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges
- Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges (en)
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skos:prefLabel
| - Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges
- Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges (en)
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skos:notation
| - RIV/68378271:_____/14:00439381!RIV15-AV0-68378271
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/14:00439381
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - electron-impact ionization; physical vapor-deposition; cross-sections; plasma parameters; rate coefficients; low-pressure; energy; atoms; films; ions (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - US - Spojené státy americké
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Journal of Applied Physics
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Hubička, Zdeněk
- Drache, S.
- Hippler, R.
- Straňák, V.
- Čada, Martin
- Tichý, M.
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http://linked.open...ain/vavai/riv/wos
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issn
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number of pages
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http://bibframe.org/vocab/doi
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