About: Optimization of various technological processes in the fabrication of silicon based layers in SVCS process innovation high-temperature horizontal furnace SV-FUR reactors using multiphysics CFD-ace+ software

Facets (new session)
Description
Metadata
Settings
- owl:sameAs
- Inference Rule:

About: Optimization of various technological processes in the fabrication of silicon based layers in SVCS process innovation high-temperature horizontal furnace SV-FUR reactors using multiphysics CFD-ace+ software Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	A fabrication cycle of silicon based layers in semiconductor and PV industry includes several high-temperature processes. While the atmospheric-pressure thermal oxidation and diffusion are used for the SiO2 deposition and phosphorus or boron doping, respectively, the low-pressure CVD or plasma-enhanced CVD processes are used for the preparation of passivation and anti-reflecting coatings. One of the most important requirements in the production is a good homogeneity of the surface film created by the particular reaction process both across the Si wafer and within the whole load. In this contribution will be shown that the multiphysics modelling using the dedicated software package is very helpful in the optimization of process parameters leading not only to better homogeneity, but also to bet terutilization of the process gases, shortening the process time and other benefits, finally leading to an improvement of the manufacturing profitability and competitiveness of the product. A fabrication cycle of silicon based layers in semiconductor and PV industry includes several high-temperature processes. While the atmospheric-pressure thermal oxidation and diffusion are used for the SiO2 deposition and phosphorus or boron doping, respectively, the low-pressure CVD or plasma-enhanced CVD processes are used for the preparation of passivation and anti-reflecting coatings. One of the most important requirements in the production is a good homogeneity of the surface film created by the particular reaction process both across the Si wafer and within the whole load. In this contribution will be shown that the multiphysics modelling using the dedicated software package is very helpful in the optimization of process parameters leading not only to better homogeneity, but also to bet terutilization of the process gases, shortening the process time and other benefits, finally leading to an improvement of the manufacturing profitability and competitiveness of the product. (en)
Title	Optimization of various technological processes in the fabrication of silicon based layers in SVCS process innovation high-temperature horizontal furnace SV-FUR reactors using multiphysics CFD-ace+ software Optimization of various technological processes in the fabrication of silicon based layers in SVCS process innovation high-temperature horizontal furnace SV-FUR reactors using multiphysics CFD-ace+ software (en)
skos:prefLabel	Optimization of various technological processes in the fabrication of silicon based layers in SVCS process innovation high-temperature horizontal furnace SV-FUR reactors using multiphysics CFD-ace+ software Optimization of various technological processes in the fabrication of silicon based layers in SVCS process innovation high-temperature horizontal furnace SV-FUR reactors using multiphysics CFD-ace+ software (en)
skos:notation	RIV/68378271:_____/13:00424296!RIV14-AV0-68378271
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(TA01020972)
http://linked.open...vai/riv/dodaniDat	2014
http://linked.open...aciTvurceVysledku	Sveshnikov, Alexey Potocký, Štěpán Jirásek, Vít
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	94500
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/13:00424296
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	plasma; CVD processes; Si substrate (en)
http://linked.open.../riv/klicoveSlovo	CVD processes Si substrate plasma
http://linked.open...ontrolniKodProRIV	[04D08A3AB253]
http://linked.open...v/mistoKonaniAkce	Štrbské Pleso
http://linked.open...i/riv/mistoVydani	Bratislava
http://linked.open...i/riv/nazevZdroje	Perspektívne vákuové metódy a technológie (Perspective vacuum methods and technologies)
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Modification of the particular technology facilities of the batch processes for the yield enhancement of the highly efficient silicon solar cells using the numerical and physical pre- and post-processing models CFD-ACE+ and Flow Simulation.
http://linked.open...UplatneniVysledku	2013
http://linked.open...iv/tvurceVysledku	Sveshnikov, Alexey Potocký, Štěpán Jirásek, Vít Poruba, A.
http://linked.open...vavai/riv/typAkce	EUR - Evropská
http://linked.open.../riv/zahajeniAkce	2013-10-10 (xsd:date)
number of pages	7 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Slovenská vákuová spoločnosť
https://schema.org/isbn	978-80-971179-2-4

Faceted Search & Find service v1.16.118 as of Jun 21 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 48 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software