About: Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system     Goto   Sponge   NotDistinct   Permalink

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Description
  • The high power impulse magnetron sputtering deposition system (HiPIMS) equipped with 5 cm in diameter titanium target has been investigated by means of time-resolved modified Katsumata probe. The probe allows for determination of the ion velocity distribution function. Compact construction of modified Katsumata probe allows us to place the probe in an arbitrary position with respect to planar magnetron. The present construction of modified Katsumata probe allows reaching the acceptance angle of about 15°. The ion velocity distribution function (IVDF) in forward direction is then directly proportional to the derivative of measured ion current with respect to the retarding potential. An angle-resolved study of HiPIMS system operating in the reactive atmosphere has been carried out. The effect of oxygen partial pressure on measured IVDF at different angles within the plasma pulse has been investigated.
  • The high power impulse magnetron sputtering deposition system (HiPIMS) equipped with 5 cm in diameter titanium target has been investigated by means of time-resolved modified Katsumata probe. The probe allows for determination of the ion velocity distribution function. Compact construction of modified Katsumata probe allows us to place the probe in an arbitrary position with respect to planar magnetron. The present construction of modified Katsumata probe allows reaching the acceptance angle of about 15°. The ion velocity distribution function (IVDF) in forward direction is then directly proportional to the derivative of measured ion current with respect to the retarding potential. An angle-resolved study of HiPIMS system operating in the reactive atmosphere has been carried out. The effect of oxygen partial pressure on measured IVDF at different angles within the plasma pulse has been investigated. (en)
Title
  • Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system
  • Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system (en)
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  • Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system
  • Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system (en)
skos:notation
  • RIV/68378271:_____/13:00421856!RIV14-MSM-68378271
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  • RIV/68378271:_____/13:00421856
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  • HiPIMS; titania; Katsumata probe; ion sensitive probe; IVDF; angular resolution (en)
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  • 549
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  • Adámek, Petr
  • Kment, Štěpán
  • Olejníček, Jiří
  • Hubička, Zdeněk
  • Hippler, R.
  • Straňák, V.
  • Čada, Martin
http://linked.open...ain/vavai/riv/wos
  • 000327537100033
issn
  • 0040-6090
number of pages
http://bibframe.org/vocab/doi
  • 10.1016/j.tsf.2013.06.061
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