About: Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering

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About: Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The effect of energetic ion bombardment on TiO2 crystallographic phase formation was studied. Films were deposited using high-power impulse magnetron sputtering (HiPIMS) assisted by an electron cyclotron wave resonance (ECWR) plasma. The ECWR assistance allows a significant reduction of pressure down to 0.075 Pa during reactive HiPIMS deposition and subsequently enables control of the energy of the deposited species over a wide range. Films deposited at high ion energies and deposition rates form rutile with (101) a preferred orientation. With decreasing ion energy and deposition rates, rutile is formed with random crystallite orientation, and finally at low ion energies the anatase phase occurs. It is supposed that particles gain high energy during the HiPIMS pulse while the ECWR discharge is mostly responsible for substrate heating due to dissipated power. However, the energetic contribution of the ECWR discharge is not sufficient for annealing and phase transformation. The effect of energetic ion bombardment on TiO2 crystallographic phase formation was studied. Films were deposited using high-power impulse magnetron sputtering (HiPIMS) assisted by an electron cyclotron wave resonance (ECWR) plasma. The ECWR assistance allows a significant reduction of pressure down to 0.075 Pa during reactive HiPIMS deposition and subsequently enables control of the energy of the deposited species over a wide range. Films deposited at high ion energies and deposition rates form rutile with (101) a preferred orientation. With decreasing ion energy and deposition rates, rutile is formed with random crystallite orientation, and finally at low ion energies the anatase phase occurs. It is supposed that particles gain high energy during the HiPIMS pulse while the ECWR discharge is mostly responsible for substrate heating due to dissipated power. However, the energetic contribution of the ECWR discharge is not sufficient for annealing and phase transformation. (en)
Title	Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering (en)
skos:prefLabel	Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering (en)
skos:notation	RIV/68378271:_____/13:00393045!RIV14-MSM-68378271
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(GAP205/11/0386), P(LD12002)
http://linked.open...iv/cisloPeriodika	MAY
http://linked.open...vai/riv/dodaniDat	2014
http://linked.open...aciTvurceVysledku	Čada, Martin Hubička, Zdeněk
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	68417
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/13:00393045
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	HiPIMS; ECWR; TiO2; Rutile; Anatase; IDF (en)
http://linked.open.../riv/klicoveSlovo	IDF TiO2 ECWR HiPIMS Anatase Rutile
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[373FD398B4AC]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...vavai/riv/projekt	Investigation of hybrid HiPIMS systems for deposition of nanostructured thin films Advanced experimental research of discharge plasma sources applied for deposition of nanostructured thin films
http://linked.open...UplatneniVysledku	2013
http://linked.open...v/svazekPeriodika	222
http://linked.open...iv/tvurceVysledku	Hubička, Zdeněk Drache, S. Hippler, R. Straňák, V. Čada, Martin Tichý, M. Wulff, H. Herrendorf, A.-P.
http://linked.open...ain/vavai/riv/wos	000318135100016
issn	0257-8972
number of pages	6 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.surfcoat.2013.02.012

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