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  • Diamond thin films were deposited in the linear antenna microwave plasma system. The micro- or nano-sized character of grown crystals was controlled by total gas pressure and CO2 content in the hydrogen rich gas mixture. Both these process parameters were shown as principal factors shifting the diamond growth either into re-nucleation or to crystal-enlargement mode. Thus the detailed study on total gas pressure influence onto growth kinetics and gas chemistry is presented.
  • Diamond thin films were deposited in the linear antenna microwave plasma system. The micro- or nano-sized character of grown crystals was controlled by total gas pressure and CO2 content in the hydrogen rich gas mixture. Both these process parameters were shown as principal factors shifting the diamond growth either into re-nucleation or to crystal-enlargement mode. Thus the detailed study on total gas pressure influence onto growth kinetics and gas chemistry is presented. (en)
Title
  • Large area growth of functional and electronic-grade diamond thin films - today's reality
  • Large area growth of functional and electronic-grade diamond thin films - today's reality (en)
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  • Large area growth of functional and electronic-grade diamond thin films - today's reality
  • Large area growth of functional and electronic-grade diamond thin films - today's reality (en)
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  • RIV/68378271:_____/12:00399675!RIV14-GA0-68378271
http://linked.open...avai/riv/aktivita
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  • I, P(GAP108/11/0794), P(GAP108/12/0910)
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  • 146443
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  • RIV/68378271:_____/12:00399675
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  • diamond thin films; large area deposition; linear plasma; pressure (en)
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  • [167E1397896B]
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  • Štrbské pleso
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  • Bratislava
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  • Progresívne materiály a vákuum ( Progressive materials and vacuum)
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  • Babchenko, Oleg
  • Kromka, Alexander
  • Rezek, Bohuslav
  • Ižák, Tibor
  • Potocký, Štěpán
  • Varga, Marián
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number of pages
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  • Slovenská vakuová spolocnosť
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  • 978-80-971179-0-0
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