About: Comparative study on dry etching of polycrystalline diamond thin films

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The reactive ion etching technique was used to etch diamond films. In this study we investigate the influence of process parameters (pressure, rf power, gas composition). The surface morphology of etched diamond films was characterized by SEM and the chemical composition of the etched film part was investigated by Raman Spectroscopy. We found that the gas composition had a crucial effect on the diamond film morphology. The use of CF4 gas resulted in flatter surfaces and lateral-like etching, while the use of pure O2 gas resulted in needle-like structures. Addition of argon to the reactant precursors increased the ion bombardment, which in turn increased the formation of non-diamond phases. Next, increasing the rf power from 100 to 500 W increased the etching rate from 5.4 to 8.6 μm/h. In contrast to this observation, the rise of process pressure from 80 to 150 mTorr lowered the etching rate from 5.6 down to 3.6 μm/h. The reactive ion etching technique was used to etch diamond films. In this study we investigate the influence of process parameters (pressure, rf power, gas composition). The surface morphology of etched diamond films was characterized by SEM and the chemical composition of the etched film part was investigated by Raman Spectroscopy. We found that the gas composition had a crucial effect on the diamond film morphology. The use of CF4 gas resulted in flatter surfaces and lateral-like etching, while the use of pure O2 gas resulted in needle-like structures. Addition of argon to the reactant precursors increased the ion bombardment, which in turn increased the formation of non-diamond phases. Next, increasing the rf power from 100 to 500 W increased the etching rate from 5.4 to 8.6 μm/h. In contrast to this observation, the rise of process pressure from 80 to 150 mTorr lowered the etching rate from 5.6 down to 3.6 μm/h. (en)
Title	Comparative study on dry etching of polycrystalline diamond thin films Comparative study on dry etching of polycrystalline diamond thin films (en)
skos:prefLabel	Comparative study on dry etching of polycrystalline diamond thin films Comparative study on dry etching of polycrystalline diamond thin films (en)
skos:notation	RIV/68378271:_____/12:00389069!RIV13-AV0-68378271
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(IAAX00100902), P(KAN400100701), P(KAN400480701), Z(AV0Z10100521)
http://linked.open...iv/cisloPeriodika	6
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Ledinský, Martin Kromka, Alexander Hruška, Karel Babchenko, Oleg Ižák, Tibor Verveniotis, Elisseos
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	127830
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/12:00389069
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	polycrystalline diamond; reactive ion etching; smoothing; diamond nanorods (en)
http://linked.open.../riv/klicoveSlovo	smoothing diamond nanorods polycrystalline diamond reactive ion etching
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[A439CB29EA5D]
http://linked.open...i/riv/nazevZdroje	Vacuum
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	Functional hybrid nanosystems of semiconductors and metals with organic materials (FUNS) NANOSTRUCTURES BASED ON CARBON AND POLYMERS FOR APPLICATION IN BIOELECTRONIC AND MEDICINE Electronically and chemically optimized nanocrystalline diamond structures for bio-applications
http://linked.open...UplatneniVysledku	2012
http://linked.open...v/svazekPeriodika	86
http://linked.open...iv/tvurceVysledku	Babchenko, Oleg Hruška, Karel Kromka, Alexander Ižák, Tibor Ledinský, Martin Verveniotis, Elisseos
http://linked.open...ain/vavai/riv/wos	000301018400053
http://linked.open...n/vavai/riv/zamer	Physics and technology of nanostructures, surfaces and thin films
issn	0042-207X
number of pages	4 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.vacuum.2011.07.023

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