About: PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://dx.doi.org/10.1016/j.apsusc.2012.02.042
Description	Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 °C and 150 °C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm2 to 9 J cm2), and discharge power were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers’ crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties. Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 °C and 150 °C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm2 to 9 J cm2), and discharge power were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers’ crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties. (en)
Title	PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers (en)
skos:prefLabel	PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers (en)
skos:notation	RIV/68378271:_____/12:00382104!RIV13-AV0-68378271
http://linked.open...avai/riv/aktivita	S Z
http://linked.open...avai/riv/aktivity	S, Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika	23
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Mikšovský, Jan Jelínek, Miroslav
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	158923
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/12:00382104
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	pulsed laser deposition; titanium dioxide,; photocatalysis,; RF discharge; thin films (en)
http://linked.open.../riv/klicoveSlovo	RF discharge photocatalysis pulsed laser deposition thin films titanium dioxide
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[730686F5BA1A]
http://linked.open...i/riv/nazevZdroje	Applied Surface Science
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	3 (xsd:int)
http://linked.open...UplatneniVysledku	2012
http://linked.open...v/svazekPeriodika	258
http://linked.open...iv/tvurceVysledku	Jelínek, Miroslav Mikšovský, Jan Remsa, J.
http://linked.open...ain/vavai/riv/wos	000307241800047
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology
issn	0169-4332
number of pages	4 (xsd:int)

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