About: Nanodiamond seeding of rough substrates

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Efficient growth of nanocrystalline diamond (NCD) requires nucleation enhancement before chemical vapour deposition step. Nanodiamond (ND) seeding is a commonly used technique that yields high nucleation densities. This technique is well established for conventional planar substrates with low surface roughness. However, many engineering application requires NCD grow on rough and/or non-planar substrates. In this work, we investigate quality of nanodiamond seeding on silicon substrates of high surface roughness (RMS roughness <1 mm). Seeded substrates and deposited diamond films were analysed by atomic force microscopy (AFM), scanning electron microscopy (SEM) and Raman spectroscopy. We discuss influence of nanodiamond particles in seeding solution and seeding technique on nucleation density and quality of deposited NCD film. Efficient growth of nanocrystalline diamond (NCD) requires nucleation enhancement before chemical vapour deposition step. Nanodiamond (ND) seeding is a commonly used technique that yields high nucleation densities. This technique is well established for conventional planar substrates with low surface roughness. However, many engineering application requires NCD grow on rough and/or non-planar substrates. In this work, we investigate quality of nanodiamond seeding on silicon substrates of high surface roughness (RMS roughness <1 mm). Seeded substrates and deposited diamond films were analysed by atomic force microscopy (AFM), scanning electron microscopy (SEM) and Raman spectroscopy. We discuss influence of nanodiamond particles in seeding solution and seeding technique on nucleation density and quality of deposited NCD film. (en)
Title	Nanodiamond seeding of rough substrates Nanodiamond seeding of rough substrates (en)
skos:prefLabel	Nanodiamond seeding of rough substrates Nanodiamond seeding of rough substrates (en)
skos:notation	RIV/68378271:_____/11:00433409!RIV15-AV0-68378271
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(KAN200100801), P(KAN400480701), P(LD11076)
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Fekete, Ladislav Fendrych, František Taylor, Andrew
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	214757
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/11:00433409
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	nanocrystalline diamond; rough silicon (en)
http://linked.open.../riv/klicoveSlovo	rough silicon nanocrystalline diamond
http://linked.open...ontrolniKodProRIV	[C62ABBB0F278]
http://linked.open...v/mistoKonaniAkce	Kladno
http://linked.open...i/riv/mistoVydani	Prague
http://linked.open...i/riv/nazevZdroje	Instruments and methods for biology and medicine 2011, Conference proceedings
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	Growth and optimisation of nanodiamond thin films for applications to biology, medicine and smart bioelectronics Bioactive Biocompatible Surfaces and Novel Nanostructured Composites for Applications to Medicine and Drug Delivery NANOSTRUCTURES BASED ON CARBON AND POLYMERS FOR APPLICATION IN BIOELECTRONIC AND MEDICINE
http://linked.open...UplatneniVysledku	2011
http://linked.open...iv/tvurceVysledku	Fekete, Ladislav Fendrych, František Nesládek, M. Taylor, Andrew Petrák, V. Stefanovič, M. Vlčková, M.
http://linked.open...vavai/riv/typAkce	CST - Celostátní
http://linked.open.../riv/zahajeniAkce	2011-06-02 (xsd:date)
number of pages	5 (xsd:int)
http://purl.org/ne...btex#hasPublisher	České vysoké učení technické v Praze
https://schema.org/isbn	978-80-01-04915-0

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