About: In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film     Goto   Sponge   NotDistinct   Permalink

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Description
  • Ultrathin nanostructured silver films exhibit unusual properties and performances. Functional properties of the film depend strongly on the nanostructure that can be manipulated by varying nucleation and growth conditions, which are in the case of RF magnetron sputtering closely related to plasma parameters. The sputtering process and the film growth are significantly influenced by the mass ratio of deposited atoms and sputtering gas ions. Deposition conditions promoting the growth of nanostructured film can be established via varying plasma parameters, i.e. mass, energy and flux of atoms and ions impinging the substrate and the ratio of atoms and ions.
  • Ultrathin nanostructured silver films exhibit unusual properties and performances. Functional properties of the film depend strongly on the nanostructure that can be manipulated by varying nucleation and growth conditions, which are in the case of RF magnetron sputtering closely related to plasma parameters. The sputtering process and the film growth are significantly influenced by the mass ratio of deposited atoms and sputtering gas ions. Deposition conditions promoting the growth of nanostructured film can be established via varying plasma parameters, i.e. mass, energy and flux of atoms and ions impinging the substrate and the ratio of atoms and ions. (en)
Title
  • In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film
  • In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film (en)
skos:prefLabel
  • In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film
  • In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film (en)
skos:notation
  • RIV/68378271:_____/11:00390588!RIV13-GA0-68378271
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GAP108/11/0958), P(GAP108/11/1298), P(GP202/09/P324), P(MEB091125), Z(AV0Z10100522)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 205032
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/11:00390588
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • silver; magnetron sputtering; in-situ monitoring; plasma characterization (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [AC4CA5D5C687]
http://linked.open...in/vavai/riv/obor
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http://linked.open...vavai/riv/projekt
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http://linked.open...iv/tvurceVysledku
  • Lančok, Ján
  • Musil, Jindřich
  • Novotný, Michal
  • Pokorný, P.
  • Piksová, K.
  • Bulíř, Jiří
  • Fekete, Ladislav
  • Čekada, M.
http://linked.open...n/vavai/riv/zamer
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