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rdf:type
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Description
| - Size-controlled Cu clusters are formed in a system which combines pulsed magnetron sputtering and gas condensation at room temperature. The discharge repetition frequency (0.1–25 kHz) and the duty cycles (20–90%) of the magnetron sputtering are varied systematically, the influence of discharge current (100–800 mA) and the pressure in the condensation tube (25–90 Pa) is also investigated. For all preparation conditions, the cluster mass shows a lognormal distribution. A non-monotonic frequency dependence with a maximum at 1 kHz and 20% of duty cycle is observed (about 105amu, or cluster diameter 8–10 nm). By adjusting discharge frequency and duty cycle, the cluster mass can be decreased by one order of magnitude. We suggest that this effect is caused by energy dissipated into the aggregation tube; and find a critical buffer gas temperature Tg-cr which limits cluster growth.
- Size-controlled Cu clusters are formed in a system which combines pulsed magnetron sputtering and gas condensation at room temperature. The discharge repetition frequency (0.1–25 kHz) and the duty cycles (20–90%) of the magnetron sputtering are varied systematically, the influence of discharge current (100–800 mA) and the pressure in the condensation tube (25–90 Pa) is also investigated. For all preparation conditions, the cluster mass shows a lognormal distribution. A non-monotonic frequency dependence with a maximum at 1 kHz and 20% of duty cycle is observed (about 105amu, or cluster diameter 8–10 nm). By adjusting discharge frequency and duty cycle, the cluster mass can be decreased by one order of magnitude. We suggest that this effect is caused by energy dissipated into the aggregation tube; and find a critical buffer gas temperature Tg-cr which limits cluster growth. (en)
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Title
| - Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system
- Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system (en)
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skos:prefLabel
| - Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system
- Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system (en)
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skos:notation
| - RIV/68378271:_____/11:00367262!RIV12-AV0-68378271
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(1M06002), P(GAP205/11/0386), P(KAN301370701), P(KJB100100805), S, Z(AV0Z10100522), Z(MSM0021620834)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/11:00367262
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - Cu cluster growth; pulsed magnetron sputtering; cluster mass- and size- distribution; AFM (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - CH - Švýcarská konfederace
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Surface and Coatings Technology
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Jastrabík, Lubomír
- Hubička, Zdeněk
- Drache, S.
- Hippler, R.
- Straňák, V.
- Tichý, M.
- Block, S.
- Helm, Ch. A.
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http://linked.open...ain/vavai/riv/wos
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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http://bibframe.org/vocab/doi
| - 10.1016/j.surfcoat.2010.10.030
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