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  • In order to control the nanostructure of aluminum thin films fabricated by RF magnetron sputtering, we made use of in-situ monitoring of electrical and optical properties of the growing layer as well as plasma characterization by mass and optical emission spectroscopy. The electrical conductivity and I-V characteristics were measured. The optical constants were obtained from optical monitoring based on spectral ellipsometry. The relevant models (based on one or two Lorentz oscillators and B-spline functions) were suggested to evaluate the data obtained from themonitoring techniques. The results of the in-situ monitoring were correlated with scanning electron microscope analyses. The nanostructure was effectively manipulated by RF power variation. Optical functions exhibiting plasmonic behavior in the UV range and a strong nonlinear character of I-V curves were obtained for an ultrathin Al film deposited at a lower growth rate.
  • In order to control the nanostructure of aluminum thin films fabricated by RF magnetron sputtering, we made use of in-situ monitoring of electrical and optical properties of the growing layer as well as plasma characterization by mass and optical emission spectroscopy. The electrical conductivity and I-V characteristics were measured. The optical constants were obtained from optical monitoring based on spectral ellipsometry. The relevant models (based on one or two Lorentz oscillators and B-spline functions) were suggested to evaluate the data obtained from themonitoring techniques. The results of the in-situ monitoring were correlated with scanning electron microscope analyses. The nanostructure was effectively manipulated by RF power variation. Optical functions exhibiting plasmonic behavior in the UV range and a strong nonlinear character of I-V curves were obtained for an ultrathin Al film deposited at a lower growth rate. (en)
Title
  • In-situ monitoring of the growth of nanostructured aluminum thin film
  • In-situ monitoring of the growth of nanostructured aluminum thin film (en)
skos:prefLabel
  • In-situ monitoring of the growth of nanostructured aluminum thin film
  • In-situ monitoring of the growth of nanostructured aluminum thin film (en)
skos:notation
  • RIV/68378271:_____/11:00361263!RIV13-GA0-68378271
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GP202/09/P324), P(IAA100100718), P(IAA100100729), Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika
  • 5
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 205031
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/11:00361263
http://linked.open...riv/jazykVysledku
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  • aluminum ultrathin film; magnetron sputtering; in-situ monitoring; electrical conductivity; spectral ellipsometry; optical emission spectroscopy (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [B3578EDE1B0F]
http://linked.open...i/riv/nazevZdroje
  • Journal of Nanophotonics
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 5
http://linked.open...iv/tvurceVysledku
  • Lančok, Ján
  • Novotný, Michal
  • Pokorný, Petr
  • Bodnár, Michal
  • Bulíř, Jiří
http://linked.open...ain/vavai/riv/wos
  • 000289550100001
http://linked.open...n/vavai/riv/zamer
issn
  • 1934-2608
number of pages
http://bibframe.org/vocab/doi
  • 10.1117/1.3543816
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