About: Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs

Facets (new session)
Description
Metadata
Settings
- owl:sameAs
- Inference Rule:

About: Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Time-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 μs and 500 μs between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hz and duty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternately serving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters. Time-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 μs and 500 μs between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hz and duty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternately serving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters. (en)
Title	Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs (en)
skos:prefLabel	Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs (en)
skos:notation	RIV/68378271:_____/11:00359582!RIV12-AV0-68378271
http://linked.open...avai/riv/aktivita	P S Z
http://linked.open...avai/riv/aktivity	P(1M06002), P(GA202/09/0800), P(GAP205/11/0386), P(GP202/09/P159), P(KAN301370701), P(KJB100100805), S, Z(AV0Z10100522), Z(MSM0021620834)
http://linked.open...iv/cisloPeriodika	2-3
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Čada, Martin Hubička, Zdeněk
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	235385
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/11:00359582
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	time-resolved plasma diagnostics; optical emission spectroscopy; Langmuir probe; magnetron sputtering (en)
http://linked.open.../riv/klicoveSlovo	magnetron sputtering Langmuir probe optical emission spectroscopy time-resolved plasma diagnostics
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[D9814F3D1A98]
http://linked.open...i/riv/nazevZdroje	Contributions to Plasma Physics
http://linked.open...in/vavai/riv/obor	BH
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	Optical structures, detection systems and relevant technologies for low photon number applications Advanced experimental research of discharge plasma sources applied for deposition of nanostructured thin films Nanostructured Macroscopic Systems - Technology and Characterisation A diagnostics of pulsed plasma generated in systems with plasma jets used for technological applications of thin film deposition. Pulse mode and microwave plasma sources - research and applications An investigation of low-temperature plasma in systems of a planar magnetron, in systems with hollow cathodes and a microwave surfatron
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	51
http://linked.open...iv/tvurceVysledku	Hubička, Zdeněk Drache, S. Hippler, R. Straňák, V. Čada, Martin Tichý, M.
http://linked.open...ain/vavai/riv/wos	000288610800020
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology Condensed Matter Physics – New Materials and Technologies
issn	0863-1042
number of pages	9 (xsd:int)
http://bibframe.org/vocab/doi	10.1002/ctpp.201000065

Faceted Search & Find service v1.16.118 as of Jun 21 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 58 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software