About: Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources     Goto   Sponge   NotDistinct   Permalink

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  • We investigated the damage mechanism of MoN/SiN multilayer XUV optics under two extreme conditions: thermal annealing and irradiation with single shot intense XUV pulses from the free-electron laser facility in Hamburg - FLASH. The damage was studied %22post-mortem%22 by means of X-ray diffraction, interference-polarizing optical microscopy, atomic force microscopy, and scanning transmission electron microscopy. Although the timescale of the damage processes and the damage threshold temperatures were different (in the case of annealing it was the dissociation temperature of Mo2N and in the case of XUV irradiation it was the melting temperature of MoN) the main damage mechanism is very similar: molecular dissociation and the formation of N-2, leading to bubbles inside the multilayer structure.
  • We investigated the damage mechanism of MoN/SiN multilayer XUV optics under two extreme conditions: thermal annealing and irradiation with single shot intense XUV pulses from the free-electron laser facility in Hamburg - FLASH. The damage was studied %22post-mortem%22 by means of X-ray diffraction, interference-polarizing optical microscopy, atomic force microscopy, and scanning transmission electron microscopy. Although the timescale of the damage processes and the damage threshold temperatures were different (in the case of annealing it was the dissociation temperature of Mo2N and in the case of XUV irradiation it was the melting temperature of MoN) the main damage mechanism is very similar: molecular dissociation and the formation of N-2, leading to bubbles inside the multilayer structure. (en)
Title
  • Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources
  • Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources (en)
skos:prefLabel
  • Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources
  • Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources (en)
skos:notation
  • RIV/68378271:_____/11:00359322!RIV12-AV0-68378271
http://linked.open...avai/riv/aktivita
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  • P(IAA400100701), P(KAN300100801), P(LA08024), P(LC510), P(LC528), Z(AV0Z10100523)
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  • 1
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  • 192806
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  • RIV/68378271:_____/11:00359322
http://linked.open...riv/jazykVysledku
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  • laser damage; thermal effects; multilayers; optical design and fabrication; free-electron lasers (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [D9582EA910C3]
http://linked.open...i/riv/nazevZdroje
  • Optics Express
http://linked.open...in/vavai/riv/obor
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  • 19
http://linked.open...iv/tvurceVysledku
  • Burian, Tomáš
  • Chalupský, Jaromír
  • Hájková, Věra
  • Juha, Libor
  • Krzywinski, J.
  • Vyšín, Luděk
  • Bijkerk, F.
  • Bruijn, S.
  • Cihelka, Jaroslav
  • Gleeson, A.
  • Grzonka, J.
  • Gullikson, E. M.
  • Hau-Riege, S.
  • Jurek, M.
  • Khorsand, A. R.
  • Klinger, D.
  • London, R.
  • Louis, E.
  • Pelka, J. B.
  • Płociński, T.
  • Rasiński, M.
  • Sobierajski, R.
  • Tiedtke, K.
  • Toleikis, S.
  • Wabnitz, H.
  • van de Kruijs, R.W.E.
http://linked.open...ain/vavai/riv/wos
  • 000285915300031
http://linked.open...n/vavai/riv/zamer
issn
  • 1094-4087
number of pages
http://bibframe.org/vocab/doi
  • 10.1364/OE.19.000193
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