About: Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	A current of positive ions to a substrate was studied in the pulsed dc hollow cathode plasma jet system for deposition of thin films working at low pressures. The time evolution of the ion current density to the probe ji was determined for the whole period of modulation of the discharge for a discharge repetition frequency of 2.5 kHz and different duty cycles D. The mean ion current density , averaged over the whole period of the discharge, increased with decreasing D although the value of the mean discharge current was kept constant. A simple analytical model is proposed to explain this effect. It is shown that the observed rise in with decreasing D is in major part caused by the rise in the ion current in the afterglow region of the pulsed discharge. A current of positive ions to a substrate was studied in the pulsed dc hollow cathode plasma jet system for deposition of thin films working at low pressures. The time evolution of the ion current density to the probe ji was determined for the whole period of modulation of the discharge for a discharge repetition frequency of 2.5 kHz and different duty cycles D. The mean ion current density , averaged over the whole period of the discharge, increased with decreasing D although the value of the mean discharge current was kept constant. A simple analytical model is proposed to explain this effect. It is shown that the observed rise in with decreasing D is in major part caused by the rise in the ion current in the afterglow region of the pulsed discharge. (en)
Title	Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system (en)
skos:prefLabel	Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system (en)
skos:notation	RIV/68378271:_____/10:00358552!RIV12-AV0-68378271
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA202/09/0800), P(GP202/09/P159), P(KAN301370701), Z(AV0Z10100522), Z(MSM0021620834)
http://linked.open...iv/cisloPeriodika	12
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Čada, Martin Virostko, Petr Hubička, Zdeněk
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	264897
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/10:00358552
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	plasma; pulsed DC; ion flux; hollow cathode (en)
http://linked.open.../riv/klicoveSlovo	plasma pulsed DC ion flux hollow cathode
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[AAA0DCB7DC2D]
http://linked.open...i/riv/nazevZdroje	Journal of Physics D-Applied Physics
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Nanostructured Macroscopic Systems - Technology and Characterisation Pulse mode and microwave plasma sources - research and applications An investigation of low-temperature plasma in systems of a planar magnetron, in systems with hollow cathodes and a microwave surfatron
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	43
http://linked.open...iv/tvurceVysledku	Hubička, Zdeněk Čada, Martin Tichý, M. Virostko, Petr
http://linked.open...ain/vavai/riv/wos	000275435200020
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology Condensed Matter Physics – New Materials and Technologies
issn	0022-3727
number of pages	7 (xsd:int)
http://bibframe.org/vocab/doi	10.1088/0022-3727/43/12/124019

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