About: Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser     Goto   Sponge   NotDistinct   Permalink

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  • Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.
  • Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays. (en)
Title
  • Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser
  • Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser (en)
skos:prefLabel
  • Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser
  • Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser (en)
skos:notation
  • RIV/68378271:_____/10:00352022!RIV11-MSM-68378271
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(IAA400100701), P(IAAX00100903), P(KAN300100702), P(LA08024), P(LC510), P(LC528), P(ME10046), Z(AV0Z10100523)
http://linked.open...iv/cisloPeriodika
  • 23
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...dnocenehoVysledku
  • 264398
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/10:00352022
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • x-ray optics; optical materials; x-ray free electron laser (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [12473C48E955]
http://linked.open...i/riv/nazevZdroje
  • Optics Express
http://linked.open...in/vavai/riv/obor
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http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 18
http://linked.open...iv/tvurceVysledku
  • Burian, Tomáš
  • Chalupský, Jaromír
  • Hau-Riege, S. P.
  • Juha, Libor
  • Krzywinski, J.
  • Messerschmidt, M.
  • Gaudin, J.
  • Sobierajski, R.
  • Boček, J.
  • Soufli, R.
  • Bostedt, C.
  • Graf, A.
  • London, R. A.
  • Moeller, S.
  • Baker, S. L.
http://linked.open...ain/vavai/riv/wos
  • 000283940900064
http://linked.open...n/vavai/riv/zamer
issn
  • 1094-4087
number of pages
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