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rdf:type
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Description
| - Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.
- Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays. (en)
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Title
| - Interaction of short x-ray pulses
with low-Z x-ray optics materials
at the LCLS free-electron laser
- Interaction of short x-ray pulses
with low-Z x-ray optics materials
at the LCLS free-electron laser (en)
|
skos:prefLabel
| - Interaction of short x-ray pulses
with low-Z x-ray optics materials
at the LCLS free-electron laser
- Interaction of short x-ray pulses
with low-Z x-ray optics materials
at the LCLS free-electron laser (en)
|
skos:notation
| - RIV/68378271:_____/10:00352022!RIV11-MSM-68378271
|
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| - P(IAA400100701), P(IAAX00100903), P(KAN300100702), P(LA08024), P(LC510), P(LC528), P(ME10046), Z(AV0Z10100523)
|
http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/10:00352022
|
http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - x-ray optics; optical materials; x-ray free electron laser (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - US - Spojené státy americké
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
| |
http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Burian, Tomáš
- Chalupský, Jaromír
- Hau-Riege, S. P.
- Juha, Libor
- Krzywinski, J.
- Messerschmidt, M.
- Gaudin, J.
- Sobierajski, R.
- Boček, J.
- Soufli, R.
- Bostedt, C.
- Graf, A.
- London, R. A.
- Moeller, S.
- Baker, S. L.
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http://linked.open...ain/vavai/riv/wos
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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