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  • The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate φO2, magnetron voltage Ud and constant power Pd=400W delivered to the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates φO2=φAr. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films.
  • The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate φO2, magnetron voltage Ud and constant power Pd=400W delivered to the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates φO2=φAr. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films. (en)
Title
  • Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina
  • Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina (en)
skos:prefLabel
  • Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina
  • Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina (en)
skos:notation
  • RIV/68378271:_____/10:00351378!RIV11-GA0-68378271
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GP202/09/P324), P(IAA100100718), P(KAN400100653), Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika
  • 11
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 260359
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/10:00351378
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • aluminium oxide; ion-energy distribution function; magnetron; mass spectrometry; pulsed discharges (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [09E0DFD52C47]
http://linked.open...i/riv/nazevZdroje
  • Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 7
http://linked.open...iv/tvurceVysledku
  • Lančok, Ján
  • Musil, Jindřich
  • Novotný, Michal
  • Pokorný, Petr
  • Bulíř, Jiří
http://linked.open...ain/vavai/riv/wos
  • 000285212000004
http://linked.open...n/vavai/riv/zamer
issn
  • 1612-8850
number of pages
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