About: Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Conical silicon nanowires have been grown by gold nanoparticle catalyzed plasma-enhanced chemical vapor deposition. This method produces Si nanowires with a very fast growth rate (1 μm/min) and unique sharpness (< 10 nm). Raman spectroscopy has proved the presence of both crystalline and amorphous Si in the grown Si nanowire layer. The fast growth process of Si nanowires with dimensions below 10 nm holds promises in various applications in electronics, photovoltaics and atomic force microscopy. Conical silicon nanowires have been grown by gold nanoparticle catalyzed plasma-enhanced chemical vapor deposition. This method produces Si nanowires with a very fast growth rate (1 μm/min) and unique sharpness (< 10 nm). Raman spectroscopy has proved the presence of both crystalline and amorphous Si in the grown Si nanowire layer. The fast growth process of Si nanowires with dimensions below 10 nm holds promises in various applications in electronics, photovoltaics and atomic force microscopy. (en)
Title	Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition (en)
skos:prefLabel	Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition (en)
skos:notation	RIV/68378271:_____/10:00341570!RIV11-MSM-68378271
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(KAN400100701), P(LC06040), P(LC510), Z(AV0Z10100521)
http://linked.open...iv/cisloPeriodika	1-2
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Stuchlíková, The-Ha Fejfar, Antonín Ledinský, Martin Stuchlík, Jiří Holovský, Jakub Výborný, Zdeněk Hruška, Karel Kočka, Jan Červenka, Jiří
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	294199
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/10:00341570
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	nanowires; silicon; scanning electron microscopy; hemical vapor deposition; Raman spectroscopy (en)
http://linked.open.../riv/klicoveSlovo	Raman spectroscopy silicon nanowires hemical vapor deposition scanning electron microscopy
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[3135CB46FC61]
http://linked.open...i/riv/nazevZdroje	Physica Status Solidi-Rapid Research Letters
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	9 (xsd:int)
http://linked.open...cetTvurcuVysledku	9 (xsd:int)
http://linked.open...vavai/riv/projekt	Center of nanotechnology and materials for nanoelectronics Functional hybrid nanosystems of semiconductors and metals with organic materials (FUNS) Structures for Nanophotonics and Nanoelectronics
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	4
http://linked.open...iv/tvurceVysledku	Hruška, Karel Ledinský, Martin Fejfar, Antonín Stuchlík, Jiří Výborný, Zdeněk Holovský, Jakub Kočka, Jan Stuchlíková, The-Ha Červenka, Jiří
http://linked.open...ain/vavai/riv/wos	000275226400022
http://linked.open...n/vavai/riv/zamer	Physics and technology of nanostructures, surfaces and thin films
issn	1862-6254
number of pages	3 (xsd:int)

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