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  • A multilayer-coated 27-cm focal length parabola, optimized to reflect 13.5 nm wavelength at normal incidence, was used in multiple FLASH experiments and focused the beam to a sub-micron beam size. The intensity of the beam was measured indirectly from the depths of craters left by the FLASH beam on PMMA-coated substrates. Comparing simulated and experimental shapes of the craters we found the best match for a wavefront error of 0.45 nm, or λ/30. We further estimated that the FWHM of the focal spot was 350 nm and that the intensity in the focus was 1018 W/cm2. The sub-micron FLASH beam provided extreme intensity conditions essential for warm dense matter experiments. The same optic was used in multiple experiments and survived the beam. However, after the first measurements, which took place over several days, the optical surface was contaminated. This contamination reduced the mirror reflectivity, which was partially recovered by oxygen plasma cleaning.
  • A multilayer-coated 27-cm focal length parabola, optimized to reflect 13.5 nm wavelength at normal incidence, was used in multiple FLASH experiments and focused the beam to a sub-micron beam size. The intensity of the beam was measured indirectly from the depths of craters left by the FLASH beam on PMMA-coated substrates. Comparing simulated and experimental shapes of the craters we found the best match for a wavefront error of 0.45 nm, or λ/30. We further estimated that the FWHM of the focal spot was 350 nm and that the intensity in the focus was 1018 W/cm2. The sub-micron FLASH beam provided extreme intensity conditions essential for warm dense matter experiments. The same optic was used in multiple experiments and survived the beam. However, after the first measurements, which took place over several days, the optical surface was contaminated. This contamination reduced the mirror reflectivity, which was partially recovered by oxygen plasma cleaning. (en)
Title
  • Sub-micron focusing of soft x-ray free electron laser beam
  • Sub-micron focusing of soft x-ray free electron laser beam (en)
skos:prefLabel
  • Sub-micron focusing of soft x-ray free electron laser beam
  • Sub-micron focusing of soft x-ray free electron laser beam (en)
skos:notation
  • RIV/68378271:_____/09:00336002!RIV10-MSM-68378271
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(IAA400100701), P(KAN300100702), P(LA08024), P(LC510), P(LC528), Z(AV0Z10100523)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 344616
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/09:00336002
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • microfocuses; multilayer mirror; free electron laser beam (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [0A2433494226]
http://linked.open...v/mistoKonaniAkce
  • Prague
http://linked.open...i/riv/mistoVydani
  • Bellingham
http://linked.open...i/riv/nazevZdroje
  • Damage to VUV, EUV, and X-ray Optics II
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Chalupský, Jaromír
  • Hájková, Věra
  • Juha, Libor
  • Krzywinski, J.
  • Gullikson, E. M.
  • Lee, R. W.
  • Nelson, A. J.
  • Toleikis, S.
  • Tschentscher, T.
  • Bajt, S.
  • Chapman, H. N.
  • Hajdu, J.
  • Aquila, A.
  • Baker, S. L.
  • Alameda, J. B.
  • Graff, R. T.
  • Meyer Ilse, J.
  • Mirkarimi, P.
  • Spiller, E. A.
  • Vollmer, H.
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
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  • SPIE
https://schema.org/isbn
  • 9780819476357
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