About: A study of the ion flux during deposition of titanium thin films by hollow cathode plasma jet

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About: A study of the ion flux during deposition of titanium thin films by hollow cathode plasma jet Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Flux of positive ions to the substrate in the hollow cathode plasma jet system during deposition of titanium thin films was studied. The substrate was negatively biased by applying 50 kHz pulsed DC, or 0.50-1.25 MHz and 13.56 MHz high-frequency voltage to it. The ion flux determined in the DC hollow cathode discharge during the active high frequency bias was systematically higher than for the pulsed DC bias or determined right after the high frequency bias was turned off. On the other hand in the RF hollow cathode discharge, the ion fluxes determined for the active high frequency and 50 kHz low frequency bias were comparable. Possible explanations of this phenomenon are discussed. Flux of positive ions to the substrate in the hollow cathode plasma jet system during deposition of titanium thin films was studied. The substrate was negatively biased by applying 50 kHz pulsed DC, or 0.50-1.25 MHz and 13.56 MHz high-frequency voltage to it. The ion flux determined in the DC hollow cathode discharge during the active high frequency bias was systematically higher than for the pulsed DC bias or determined right after the high frequency bias was turned off. On the other hand in the RF hollow cathode discharge, the ion fluxes determined for the active high frequency and 50 kHz low frequency bias were comparable. Possible explanations of this phenomenon are discussed. (en)
Title	A study of the ion flux during deposition of titanium thin films by hollow cathode plasma jet A study of the ion flux during deposition of titanium thin films by hollow cathode plasma jet (en)
skos:prefLabel	A study of the ion flux during deposition of titanium thin films by hollow cathode plasma jet A study of the ion flux during deposition of titanium thin films by hollow cathode plasma jet (en)
skos:notation	RIV/68378271:_____/09:00333649!RIV10-MSM-68378271
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(1M06002), P(KJB100100707), P(KJB100100805), Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika	-
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Čada, Martin Virostko, Petr Hubička, Zdeněk Kment, Štěpán Jastrabík, Lubomír
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	301603
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/09:00333649
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	ion flux; plasma jet; hollow cathode; plasma diagnostics (en)
http://linked.open.../riv/klicoveSlovo	plasma diagnostics ion flux plasma jet hollow cathode
http://linked.open...odStatuVydavatele	JP - Japonsko
http://linked.open...ontrolniKodProRIV	[5D9D1598B099]
http://linked.open...i/riv/nazevZdroje	Journal of Plasma and Fusion Research SERIES
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	Optical structures, detection systems and relevant technologies for low photon number applications A diagnostics of pulsed plasma generated in systems with plasma jets used for technological applications of thin film deposition. Low-temperature plasmatic deposition of polycrystalline and nanocrystalline oxide thin films by systems with hollow cathodes
http://linked.open...UplatneniVysledku	2009
http://linked.open...v/svazekPeriodika	8
http://linked.open...iv/tvurceVysledku	Jastrabík, Lubomír Kment, Štěpán Hubička, Zdeněk Čada, Martin Tichý, M. Virostko, Petr
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology
issn	1883-9630
number of pages	5 (xsd:int)

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