About: Highly oriented crystalline Er:YAG and Er:YAP layers prepared by PLD and annealing

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	High quality, thick, highly oriented crystalline thin films of Yttrium Aluminum Garnet (Y3Al5O12) and Yttrium Aluminum Perovskite (YAlO3) doped with Erbium were prepared by pulsed laser deposition. Samples were created in vacuum or oxygen environment. Depositions were arranged at room temperature, or at high substrate temperatures ranging from 800 to 1100 8C. Amorphous layers were annealed by laser, or in oven (argon flow, temperatures in range from 1200 to 1400 8C). Fused silica and sapphire (0 0 0 1) were used as substrates. Properties of films were characterized by X-ray diffraction, atomic force microscopy, and by photoluminescence measurement. Size of crystalline grains was in the range 116–773 nm. Thickness of layers was up to 17 mm. High quality, thick, highly oriented crystalline thin films of Yttrium Aluminum Garnet (Y3Al5O12) and Yttrium Aluminum Perovskite (YAlO3) doped with Erbium were prepared by pulsed laser deposition. Samples were created in vacuum or oxygen environment. Depositions were arranged at room temperature, or at high substrate temperatures ranging from 800 to 1100 8C. Amorphous layers were annealed by laser, or in oven (argon flow, temperatures in range from 1200 to 1400 8C). Fused silica and sapphire (0 0 0 1) were used as substrates. Properties of films were characterized by X-ray diffraction, atomic force microscopy, and by photoluminescence measurement. Size of crystalline grains was in the range 116–773 nm. Thickness of layers was up to 17 mm. (en)
Title	Highly oriented crystalline Er:YAG and Er:YAP layers prepared by PLD and annealing Highly oriented crystalline Er:YAG and Er:YAP layers prepared by PLD and annealing (en)
skos:prefLabel	Highly oriented crystalline Er:YAG and Er:YAP layers prepared by PLD and annealing Highly oriented crystalline Er:YAG and Er:YAP layers prepared by PLD and annealing (en)
skos:notation	RIV/68378271:_____/09:00328762!RIV10-AV0-68378271
http://linked.open...avai/riv/aktivita	P S Z
http://linked.open...avai/riv/aktivity	P(GA202/06/0216), S, Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika	10
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Studnička, Václav Kocourek, Tomáš Remsa, Jan Jelínek, Miroslav Oswald, Jiří Čerňanský, Marian
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	317157
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/09:00328762
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Er:YAG; thin films; waveguides; PLD; laser (en)
http://linked.open.../riv/klicoveSlovo	Er:YAG laser waveguides PLD thin films
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[ED356F4369B6]
http://linked.open...i/riv/nazevZdroje	Applied Surface Science
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...vavai/riv/projekt	Study of plasma formed in hybrid arrangement of pulsed laser deposition
http://linked.open...UplatneniVysledku	2009
http://linked.open...v/svazekPeriodika	255
http://linked.open...iv/tvurceVysledku	Jelínek, Miroslav Jelínek, M. Kocourek, Tomáš Remsa, Jan Studnička, Václav Uherek, F. Oswald, Jiří Čerňanský, Marian
http://linked.open...ain/vavai/riv/wos	000263865000042
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology
issn	0169-4332
number of pages	3 (xsd:int)

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