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Description
  • Studium procesů v plazmatu během magnetronového odprašování hliníkového terče v reaktivní kyslík/argonové atmosféře ve dvou různých radiálních polohách. Byl analyzován celý cyklus %22otravy%22 terče, kdy pozornost byla věnována nestabilní oblasti přechodu z dielektrického do kovového módu. Byl sledován výskyt a chování O+, O2+, Al+ a AlO+ iontů. Mimo radiální osu byly detekovány záporné ionty O-, O2- a slabě ALO-. (cs)
  • We studied plasma processes during sputtering of aluminum target in a reactive oxygen/argon atmosphere in two radial positions. The partial pressure of oxygen was systematically changed keeping the total pressure constant (0.5 Pa). A whole target-poisoning cycle was analyzed with a special attention to unstable transition from dielectric to metallic mode. Our attention was focused to appearance of positive O+, O2+, Al +and AlO+ ions. In the radial direction in front of race-track we observed energetic negative ions of O-, O2- and weak ALO- while in the central position the negative ions disappeared. The transition from dielectric to metallic mode is followed by atomic oxygen ions decrease, while the molecular oxygen ions completely disappear from the spectra in the transition mode. The observed plasma behavior was assigned to a mechanism of the film formation.
  • We studied plasma processes during sputtering of aluminum target in a reactive oxygen/argon atmosphere in two radial positions. The partial pressure of oxygen was systematically changed keeping the total pressure constant (0.5 Pa). A whole target-poisoning cycle was analyzed with a special attention to unstable transition from dielectric to metallic mode. Our attention was focused to appearance of positive O+, O2+, Al +and AlO+ ions. In the radial direction in front of race-track we observed energetic negative ions of O-, O2- and weak ALO- while in the central position the negative ions disappeared. The transition from dielectric to metallic mode is followed by atomic oxygen ions decrease, while the molecular oxygen ions completely disappear from the spectra in the transition mode. The observed plasma behavior was assigned to a mechanism of the film formation. (en)
Title
  • Study of processes in a pulsed magnetron Ar/O2 plasma by mass spectrometry
  • Study of processes in a pulsed magnetron Ar/O2 plasma by mass spectrometry (en)
  • Studium procesů v pulsním magnetronovém Ar/O2 plazmatu pomocí hmotnostní spektrometrie (cs)
skos:prefLabel
  • Study of processes in a pulsed magnetron Ar/O2 plasma by mass spectrometry
  • Study of processes in a pulsed magnetron Ar/O2 plasma by mass spectrometry (en)
  • Studium procesů v pulsním magnetronovém Ar/O2 plazmatu pomocí hmotnostní spektrometrie (cs)
skos:notation
  • RIV/68378271:_____/08:00324133!RIV09-AV0-68378271
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(KAN400100653), Z(AV0Z10100522)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...dnocenehoVysledku
  • 398153
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/08:00324133
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • magnteron sputtering; mass spectrometry; alumina (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [B298A8F93548]
http://linked.open...v/mistoKonaniAkce
  • Hersonissos
http://linked.open...i/riv/mistoVydani
  • Paris
http://linked.open...i/riv/nazevZdroje
  • 35th EPS Conference on Plasma Physics – Contributed papers
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Lančok, Ján
  • Musil, Jindřich
  • Novotný, Michal
  • Pokorný, Petr
  • Bulíř, Jiří
  • Mišina, Martin
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
http://purl.org/ne...btex#hasPublisher
  • European Physical Society
https://schema.org/isbn
  • 2-914771-52-5
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