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  • We investigate the first stages of nanocrystalline diamond (NCD) thin film growth at low substrate temperature. NCD films were grown on silicon substrates by microwave plasma enhanced chemical vapor deposition (CVD) for 0–300 min at a temperature of 410°C. Stagnation of the AFM roughness indicates that the low temperature NCD growth is a) delayed due to the surface contamination of the used nanodiamond powder and b) possibly dominated by the growth in the lateral direction. XPS measurements showed that the measured surface exhibits changes from a multi-phase composite (seeding layer) to single phase one (NCD layer).
  • We investigate the first stages of nanocrystalline diamond (NCD) thin film growth at low substrate temperature. NCD films were grown on silicon substrates by microwave plasma enhanced chemical vapor deposition (CVD) for 0–300 min at a temperature of 410°C. Stagnation of the AFM roughness indicates that the low temperature NCD growth is a) delayed due to the surface contamination of the used nanodiamond powder and b) possibly dominated by the growth in the lateral direction. XPS measurements showed that the measured surface exhibits changes from a multi-phase composite (seeding layer) to single phase one (NCD layer). (en)
  • Počáteční fáze růstu nanokrystalických diamantových vrstev (NCD) deponovaných za nízkých teplot (410°C) na Si substráty v mikrovlnném plazmatu byli študování pro procesní čas v intervalu 0-300 minut. Stagnace AFM drsnosti indikuje že nízkoteplotní růst je oneskoren v důsledku a) kontaminace nukleačního diamantového prášku nebo b) možné dominance laterálního růstu. XPS měření potvrzují změnu povrchu s mnoho-zložkového kompozitu (nukleací vrstva) na mono-zložkový systém (NCD vrstva). (cs)
Title
  • Early stage of diamond growth at low temperature
  • Early stage of diamond growth at low temperature (en)
  • Počáteční stadia růstu diamantových vrstev za nizkých teplot (cs)
skos:prefLabel
  • Early stage of diamond growth at low temperature
  • Early stage of diamond growth at low temperature (en)
  • Počáteční stadia růstu diamantových vrstev za nizkých teplot (cs)
skos:notation
  • RIV/68378271:_____/08:00319717!RIV09-AV0-68378271
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(1M06002), P(KAN400100652), P(KAN400100701), Z(AV0Z10100521)
http://linked.open...iv/cisloPeriodika
  • 7-10
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 364766
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/08:00319717
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • nanocrystalline diamond film; AFM; SEM; low temperature CVD (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV
  • [352D00E081F6]
http://linked.open...i/riv/nazevZdroje
  • Diamond and Related Materials
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 17
http://linked.open...iv/tvurceVysledku
  • Kromka, Alexander
  • Rezek, Bohuslav
  • Zemek, Josef
  • Čermák, Jan
  • Potocký, Štěpán
  • Vaněček, Milan
http://linked.open...ain/vavai/riv/wos
  • 000259598300042
http://linked.open...n/vavai/riv/zamer
issn
  • 0925-9635
number of pages
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