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Description
  • Pro růst monokrystalického InP Czochralského metodou se využívá polykrystalický InP připravený Bridgemanovu nízkotlakou vertikální syntézu. Semiizolačního stavu, který je nezbytný pro detektorové struktury, bylo dosaženo dopováním železem nebo ko-dopováním Fe-Zn a Ti-Zn. Krystaly dopované Ta byly tepelně formovány. Defekty byly stanovovány na leptaných vzorcích RTG metodou. Krystaly byly charakterizovány hmotovou spekroskopii a měřením Hallova jevu. U detektorových struktur byla měřena detekční účinnost. (cs)
  • Bulk InP single crystals were grown by Czochralski method using vertical Bridgman low pressure synthesis of polycrystalline InP. The semi-insulating state necessary for radiation detection was created by iron doping or Fe-Zn and Ti-Zn co-doping. High temperature annealing was also done. Defects were studied by X-ray methods. For characterization the Hall measurements and mass spectroscopy were used. The detection efficiency of prepared detection structures was measured.
  • Bulk InP single crystals were grown by Czochralski method using vertical Bridgman low pressure synthesis of polycrystalline InP. The semi-insulating state necessary for radiation detection was created by iron doping or Fe-Zn and Ti-Zn co-doping. High temperature annealing was also done. Defects were studied by X-ray methods. For characterization the Hall measurements and mass spectroscopy were used. The detection efficiency of prepared detection structures was measured. (en)
Title
  • Growth of indium phosphide bulk crystals for radiation detectors
  • Growth of indium phosphide bulk crystals for radiation detectors (en)
  • Růst objemových krystalů indium fosfidu pro detektory záření (cs)
skos:prefLabel
  • Growth of indium phosphide bulk crystals for radiation detectors
  • Growth of indium phosphide bulk crystals for radiation detectors (en)
  • Růst objemových krystalů indium fosfidu pro detektory záření (cs)
skos:notation
  • RIV/68378271:_____/08:00308797!RIV08-AV0-68378271
http://linked.open.../vavai/riv/strany
  • ;;;
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA102/06/0153), P(KAN400670651), Z(AV0Z10100523), Z(AV0Z20670512)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...iv/duvernostUdaju
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  • 369685
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/08:00308797
http://linked.open...riv/jazykVysledku
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  • semiconductor technology; indium compounds (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [D378DE3D2771]
http://linked.open...v/mistoKonaniAkce
  • Versailles
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  • Piscataway
http://linked.open...i/riv/nazevZdroje
  • IPRM 2008 - Proceedings of the 20th Indium Phosphide and Related Materials Conference
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Žďánský, Karel
  • Procházková, Olga
  • Pekárek, Ladislav
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
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  • Institute of Electrical and Electronic Engineers
https://schema.org/isbn
  • 978-1-4244-2259-3
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