About: Hardness and elastic modulus of amorphous and nanocrystalline SiC and Si films

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Hydrogen-free amorphous and nanocrystalline films were prepared by magnetron sputtering of the SiC or Si targets. Mechanical properties (hardness, elastic modulus, intrinsic stress) and film structures were investigated in dependence on the substrate bias and temperature. It was found that both hardness and elastic modulus of all amorphous a-SiC films prepared at different substrate temperatures and biases are always lower than those for bulk α-SiC single crystal while the hardness of partially crystalline SiC films is higher and the elastic modulus lower than those for α-SiC one. In contrast, both hardness and elastic modulus of all amorphous Si films are always lower than those for nanocrystalline Si films which show approximately the same value as the Si single crystal. Hydrogen-free amorphous and nanocrystalline films were prepared by magnetron sputtering of the SiC or Si targets. Mechanical properties (hardness, elastic modulus, intrinsic stress) and film structures were investigated in dependence on the substrate bias and temperature. It was found that both hardness and elastic modulus of all amorphous a-SiC films prepared at different substrate temperatures and biases are always lower than those for bulk α-SiC single crystal while the hardness of partially crystalline SiC films is higher and the elastic modulus lower than those for α-SiC one. In contrast, both hardness and elastic modulus of all amorphous Si films are always lower than those for nanocrystalline Si films which show approximately the same value as the Si single crystal. (en) Vodíkuprosté amorfní a nanokrystalické filmy byly připraveny magnetronovým rozprašováním Targetů SiC a Si. V závislosti na %22bias%22 a teplotě substrátů byly zkoumány jejich mechanické vlastnosti (tvrdost, modul pružnosti, vnitřní pnutí). Bylo zjištěno, že tvrdost a modul pružnosti všech amorfních a-SiC filmů byl menší než pro %22bulk%22 α-SiC monokrystalu. Částečně krystalické filmy SiC měly vyšší tvrdost a nižší modul pružnosti než α-SiC. Naproti tomu amorfní filmy Si měly všechny tvrdost a modul pružnosti nižší než Si filmy nanokrystalické, které vykázaly přibližně tytéž hodnoty jako monokrystal Si. (cs)
Title	Hardness and elastic modulus of amorphous and nanocrystalline SiC and Si films Hardness and elastic modulus of amorphous and nanocrystalline SiC and Si films (en) Tvrdost a modul pružnosti amorfních a nanokrystalických filmů SiC a Si (cs)
skos:prefLabel	Hardness and elastic modulus of amorphous and nanocrystalline SiC and Si films Hardness and elastic modulus of amorphous and nanocrystalline SiC and Si films (en) Tvrdost a modul pružnosti amorfních a nanokrystalických filmů SiC a Si (cs)
skos:notation	RIV/68378271:_____/08:00307730!RIV08-AV0-68378271
http://linked.open.../vavai/riv/strany	1738;1745
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(1M06002), P(OC 095), P(OC 097), Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika	-
http://linked.open...vai/riv/dodaniDat	2008
http://linked.open...aciTvurceVysledku	Čtvrtlík, Radim Boháč, Petr Vorlíček, Vladimír Kulykovskyy, Valeriy Stranyánek, Martin Jastrabík, Lubomír
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	369804
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/08:00307730
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	sputtering; hardness; nanocrystalline SiC films; nanocomposites; amorphous (en)
http://linked.open.../riv/klicoveSlovo	sputtering hardness amorphous nanocomposites nanocrystalline SiC films
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[35C429E7CF45]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	http://linked.opendata.cz/resource/domain/vavai/projekt/OC%20097 Optical structures, detection systems and relevant technologies for low photon number applications http://linked.opendata.cz/resource/domain/vavai/projekt/OC%20095
http://linked.open...UplatneniVysledku	2008
http://linked.open...v/svazekPeriodika	202
http://linked.open...iv/tvurceVysledku	Jastrabík, Lubomír Boháč, Petr Kulykovskyy, Valeriy Stranyánek, Martin Vorlíček, Vladimír Čtvrtlík, Radim Kurdyumov, A.
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology
issn	0257-8972
number of pages	8 (xsd:int)

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