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  • Epitaxní tenké vrstvy ZnO byly připravovány pomocí pulsní laserové depozice s asistencí elektron cyklotron rezonančního zdroje dusíkového plazmatu. P-typ vodivosti byl pozorován u vrstev připravovaných v podmínkách zvýšené aktivace dusíkových iontů. (cs)
  • ZnO epitaxial thin films were grown on r-plane sapphire substrates, in a pulsed laser deposition apparatus assisted by an electron cyclotron resonance (ECR) N2 plasma source. The resistivities and carrier concentrations (either n- or p-type) of the thin films were measured in a Hall effect apparatus as a function of the ECR source input microwave power and the substrate temperature, respectively. P-type conduction was observed in thin films grown in conditions of enhanced activation of the nitrogen ionic species. These experimental results are in qualitative agreement with recent theoretical calculations of the activation energies of the main donor defects compensating for N acceptors in ZnO.
  • ZnO epitaxial thin films were grown on r-plane sapphire substrates, in a pulsed laser deposition apparatus assisted by an electron cyclotron resonance (ECR) N2 plasma source. The resistivities and carrier concentrations (either n- or p-type) of the thin films were measured in a Hall effect apparatus as a function of the ECR source input microwave power and the substrate temperature, respectively. P-type conduction was observed in thin films grown in conditions of enhanced activation of the nitrogen ionic species. These experimental results are in qualitative agreement with recent theoretical calculations of the activation energies of the main donor defects compensating for N acceptors in ZnO. (en)
Title
  • Nitrogen doping of ZnO thin films grown by plasma-assisted pulsed-laser deposition
  • Dusíkem dopované vrstvy ZnO připravované pomocí pulsní laserové depozice s asistencí plazmatu (cs)
  • Nitrogen doping of ZnO thin films grown by plasma-assisted pulsed-laser deposition (en)
skos:prefLabel
  • Nitrogen doping of ZnO thin films grown by plasma-assisted pulsed-laser deposition
  • Dusíkem dopované vrstvy ZnO připravované pomocí pulsní laserové depozice s asistencí plazmatu (cs)
  • Nitrogen doping of ZnO thin films grown by plasma-assisted pulsed-laser deposition (en)
skos:notation
  • RIV/68378271:_____/07:00309717!RIV08-AV0-68378271
http://linked.open.../vavai/riv/strany
  • 505;509
http://linked.open...avai/riv/aktivita
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  • Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika
  • -
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http://linked.open...aciTvurceVysledku
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  • 437365
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  • RIV/68378271:_____/07:00309717
http://linked.open...riv/jazykVysledku
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  • pulsed laser deposition; ZnO; doping; electron cyclotron resonance (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV
  • [7DB9EB34486B]
http://linked.open...i/riv/nazevZdroje
  • Journal of Physics-Condensed Matter
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 59
http://linked.open...iv/tvurceVysledku
  • Novotný, Michal
  • Mosnier, J.-P.
  • Duclére, J.-R.
  • Henry, M. O.
  • McGlynn, E.
  • O´Haire, R.
http://linked.open...n/vavai/riv/zamer
issn
  • 0953-8984
number of pages
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