Thermo-optical studies of NaNbO3 thin films, deposited by the pulsed laser ablation technique on Si/SrRuO3 substrates, were performed by spectroscopic ellipsometry in the temperature range 300-550o C
Thermo-optical studies of NaNbO3 thin films, deposited by the pulsed laser ablation technique on Si/SrRuO3 substrates, were performed by spectroscopic ellipsometry in the temperature range 300-550o C (en)