About: Hardness of nanocomposite a-C:Si films deposited by magnetron sputtering

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Description	Vodík neobsahující vrstvy a-C:Si s koncentrací Si od 3 do 70 at.% byly připravovány magnetronovým ko-sputteringem z targetů z čistého grafitu a křemíku. Mechanické vlastnosti (tvrdost,vnitřní pnutí),složení vrstev (EPMA a XPS) a struktura (elektronová difrakce a ramanova spektroskopie) byly zkoumány v závislosti na koncentraci Si, předpětí na substrátu a depoziční teplotě. Maximum tvrdosti bylo dosaženo při koncentraci Si 45 at.% a při depozičních teplotách 600 a 800 °C. Reflexní elektronová difrakce indikovala amorfní strukturu připravovaných vrstev. Ramanovy spektra ukazují na existenci 3 pásů odpovídajících klastrům Si, SiC a C pro koncentrace Si z intervalu 35 - 70 at.% (cs) Hydrogen-free a-C:Si films with Si concentration from 3 to 70 at.% were prepared by magnetron co-sputtering of pure graphite and silicon targets.Mechanical properties (hardness, intrinsic stress), film composition (EPMA and XPS) and film structure (electron diffraction, Raman spectra) were investigated in dependence on Si concentration, substrate bias and deposition temperature. The film hardness was maximal for -45 at.% of Si and deposition temperatures 600 and 800 °C. Reflection electron diffraction indicated an amorphous structure of prepared films.Raman spectra showed that the films in the range of 35 - 70 at.% of Si always contain three bands corresponding to the Si, SiC and C clusters Hydrogen-free a-C:Si films with Si concentration from 3 to 70 at.% were prepared by magnetron co-sputtering of pure graphite and silicon targets.Mechanical properties (hardness, intrinsic stress), film composition (EPMA and XPS) and film structure (electron diffraction, Raman spectra) were investigated in dependence on Si concentration, substrate bias and deposition temperature. The film hardness was maximal for -45 at.% of Si and deposition temperatures 600 and 800 °C. Reflection electron diffraction indicated an amorphous structure of prepared films.Raman spectra showed that the films in the range of 35 - 70 at.% of Si always contain three bands corresponding to the Si, SiC and C clusters (en)
Title	Hardness of nanocomposite a-C:Si films deposited by magnetron sputtering Hardness of nanocomposite a-C:Si films deposited by magnetron sputtering (en) Tvrdost nanokompozitních vrstev a-C:Si deponovaných magnetronovým naprašováním (cs)
skos:prefLabel	Hardness of nanocomposite a-C:Si films deposited by magnetron sputtering Hardness of nanocomposite a-C:Si films deposited by magnetron sputtering (en) Tvrdost nanokompozitních vrstev a-C:Si deponovaných magnetronovým naprašováním (cs)
skos:notation	RIV/68378271:_____/07:00096427!RIV08-AV0-68378271
http://linked.open.../vavai/riv/strany	167;173
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(OC 095), P(OC 097), Z(AV0Z10100520), Z(AV0Z10100521), Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika	-
http://linked.open...vai/riv/dodaniDat	2008
http://linked.open...aciTvurceVysledku	Boháč, Petr Vorlíček, Vladimír Kulykovskyy, Valeriy Zemek, Josef Jastrabík, Lubomír
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	423818
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/07:00096427
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	a-C:Si hydrogen-free films,; hardness; raman spectroscopy; XPS (en)
http://linked.open.../riv/klicoveSlovo	a-C:Si hydrogen-free films hardness XPS raman spectroscopy
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[63ECD8C83027]
http://linked.open...i/riv/nazevZdroje	Diamond and Related Materials
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	http://linked.opendata.cz/resource/domain/vavai/projekt/OC%20097 http://linked.opendata.cz/resource/domain/vavai/projekt/OC%20095
http://linked.open...UplatneniVysledku	2007
http://linked.open...v/svazekPeriodika	16
http://linked.open...iv/tvurceVysledku	Jastrabík, Lubomír Zemek, Josef Boháč, Petr Kulykovskyy, Valeriy Vorlíček, Vladimír Kurdymov, A.
http://linked.open...n/vavai/riv/zamer	Specific effects in condensed systems with reduced dimension and broken symmetry Physics and technology of nanostructures, surfaces and thin films Wave and Corpuscular Light Propagation, Optical Materials and Technology
issn	0925-9635
number of pages	7 (xsd:int)

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