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Description
  • Titanium carbonitride thin films were prepared by hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition. Carbon and titanium species were simultaneously deposited on the same rotated Si substrate. Films were fabricated at room substrate temperature in argon-nitrogen ambient atmosphere, for laser fluence of 15 J.cm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Films were studied by XRD and glow discharge optical emission spectroscopy (GDOES). Mechanical and electronic properties (XPS) were also measured.
  • Titanium carbonitride thin films were prepared by hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition. Carbon and titanium species were simultaneously deposited on the same rotated Si substrate. Films were fabricated at room substrate temperature in argon-nitrogen ambient atmosphere, for laser fluence of 15 J.cm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Films were studied by XRD and glow discharge optical emission spectroscopy (GDOES). Mechanical and electronic properties (XPS) were also measured. (en)
  • Titan-karbonitridové vrstvy byly připraveny hybridním depozičním systémem kombinujícím DC magnetron a KrF laser. Vrstvy byly připraveny za pokojové teploty a v dusíkovém okolí při hustotě laserové energie 15 Jcm-2 a výkonu magnetronu 150 W. Vrstvy byly charakterizovány metodami XRD, GDOES a XPS. (cs)
Title
  • Thin TiCN films prepared by hybrid magnetron-laser deposition
  • Thin TiCN films prepared by hybrid magnetron-laser deposition (en)
  • Tenké vrstvy TiCN připravené hybridní magnetron- laserovou depozicí (cs)
skos:prefLabel
  • Thin TiCN films prepared by hybrid magnetron-laser deposition
  • Thin TiCN films prepared by hybrid magnetron-laser deposition (en)
  • Tenké vrstvy TiCN připravené hybridní magnetron- laserovou depozicí (cs)
skos:notation
  • RIV/68378271:_____/07:00086725!RIV08-AV0-68378271
http://linked.open.../vavai/riv/strany
  • 5651;5654
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA202/06/0216), Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika
  • -
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 455115
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/07:00086725
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • laser deposition; magnetron; radio frequency discharge; thin films; TiCN (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [3D8F8656AFF2]
http://linked.open...i/riv/nazevZdroje
  • Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 4
http://linked.open...iv/tvurceVysledku
  • Jelínek, Miroslav
  • Kocourek, Tomáš
  • Kadlec, J.
  • Popov, C.
  • Santoni, A.
http://linked.open...n/vavai/riv/zamer
issn
  • 1612-8850
number of pages
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