About: Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold     Goto   Sponge   NotDistinct   Permalink

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Description
  • Amorfní uhlíková (a-C) optická pokrytí vysoké kvality tloušťky 45 nm deponovaná magnetronovým naprašováním na křemíkových substrátech byla ozářena fokusovaným svazkem kapilárním výbojovým XUV laserem. Zjistili jsme, že expozice 10, 20 a 40 pulzy vedla k poškození povrchu při fluenci 0.5 J/cm2, tedy bezpečně pod prahem poškození jedním impulzem (cs)
  • High-surface-quality amorphous carbon (a-C) optical coatings with a thickness of 45 nm, deposited by magnetron sputtering on a silicon substrate were irradiated by the focused beam of capillary-discharge Ne-like Ar XUV laser (CDL). Investigating consequences of the multiple-shot exposure it has been found that an accumulation of 10, 20 and 40 shots at a fluence of 0.5 J/cm2, i.e., below the single-shot damage threshold, causes irreversible changes of a-C thin layer which can be registered by both the AFM and the DIC microscopy
  • High-surface-quality amorphous carbon (a-C) optical coatings with a thickness of 45 nm, deposited by magnetron sputtering on a silicon substrate were irradiated by the focused beam of capillary-discharge Ne-like Ar XUV laser (CDL). Investigating consequences of the multiple-shot exposure it has been found that an accumulation of 10, 20 and 40 shots at a fluence of 0.5 J/cm2, i.e., below the single-shot damage threshold, causes irreversible changes of a-C thin layer which can be registered by both the AFM and the DIC microscopy (en)
Title
  • Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold
  • Poškození amorfního uhlíku zářením XUV laseru (46,9 nm) mnoha pulzy pod prahem poškození jedním impulzem (cs)
  • Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold (en)
skos:prefLabel
  • Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold
  • Poškození amorfního uhlíku zářením XUV laseru (46,9 nm) mnoha pulzy pod prahem poškození jedním impulzem (cs)
  • Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold (en)
skos:notation
  • RIV/68378271:_____/07:00086335!RIV08-AV0-68378271
http://linked.open.../vavai/riv/strany
  • 1;7
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(1P04LA235), P(IAA400100701), P(KAN300100702), P(LC510), P(LC528), Z(AV0Z10100523)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 412609
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/07:00086335
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • radiation damage; amorphous carbon; XUV radiation; capillary-discharge laser (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [1610FAB7BFD8]
http://linked.open...v/mistoKonaniAkce
  • Prague
http://linked.open...i/riv/mistoVydani
  • Bellingham
http://linked.open...i/riv/nazevZdroje
  • Damage to VUV, EUV, and X-ray Optics
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Chalupský, Jaromír
  • Hájková, Věra
  • Juha, Libor
  • Störmer, M.
  • Vorlíček, Vladimír
  • Reale, A.
  • Ritucci, A.
  • Zuppella, P.
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
http://purl.org/ne...btex#hasPublisher
  • SPIE
https://schema.org/isbn
  • 978-0-8194-6714-0
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