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Description
| - Článek se zabývá depozicí Bax Sr1-xTiO3 (BST) a SrTiO3 (STO) tenkých vrstev na Si a vícevrstvé Si/SiO2/TiO2/Pt substráty. Tenké vrstvy BSTO a STO byly analyzovány pomocí rentgenové difrakce. Teplota substrátu během depozice byla 500 °C. Rozprašované částice Ba a Sr byly v průběhu depozice kontrolovány pomocí optické emisní spektroskopie. Analýza vrstev pomocí XRD potvrdila přítomnost BSTO a STO ve fázi v perovskitu (cs)
- The RF modulated plasma jet system was used for the deposition of Bax Sr1-xTiO3 (BST), and SrTiO3 (STO) thin films on Si and multi-layer system Si/SiO2/TiO2/Pt substrates. BSTO and STO thin films were analyzed by X-ray diffraction. During deposition, the substrate was heated at 500 oC . Emission spectroscopy of the plasma was used for control of concentration of sputtered particles from the hollow cathode mainly Sr and Ba atoms. XRD diffraction confirmed presence of BSTO and STO perovskite phase in the films.
- The RF modulated plasma jet system was used for the deposition of Bax Sr1-xTiO3 (BST), and SrTiO3 (STO) thin films on Si and multi-layer system Si/SiO2/TiO2/Pt substrates. BSTO and STO thin films were analyzed by X-ray diffraction. During deposition, the substrate was heated at 500 oC . Emission spectroscopy of the plasma was used for control of concentration of sputtered particles from the hollow cathode mainly Sr and Ba atoms. XRD diffraction confirmed presence of BSTO and STO perovskite phase in the films. (en)
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Title
| - Bax Sr1-xTiO3 Thin Films Deposited by RF Hollow Cathode Plasma Jet Technique
- Depozice Bax Sr1-xTiO3 tenkých vrstev pomocí RF výboje v duté katodě (cs)
- Bax Sr1-xTiO3 Thin Films Deposited by RF Hollow Cathode Plasma Jet Technique (en)
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skos:prefLabel
| - Bax Sr1-xTiO3 Thin Films Deposited by RF Hollow Cathode Plasma Jet Technique
- Depozice Bax Sr1-xTiO3 tenkých vrstev pomocí RF výboje v duté katodě (cs)
- Bax Sr1-xTiO3 Thin Films Deposited by RF Hollow Cathode Plasma Jet Technique (en)
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skos:notation
| - RIV/68378271:_____/05:00023637!RIV06-AV0-68378271
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(KJB1010301), P(KJB1010302), Z(AV0Z10100522), Z(MSM0021620834)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/05:00023637
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - ferroelectric thin films; hollow catode; emission spectroscopy; ellipsometry (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Jastrabík, Lubomír
- Olejníček, Jiří
- Hubička, Zdeněk
- Čada, Martin
- Chvostová, Dagmar
- Deyneka, Alexander
- Virostko, Petr
- Šícha, Miloš
- Šíchová, Hana
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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