About: Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering.

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About: Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering. Goto Sponge NotDistinct Permalink

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Description	Hydrogenated carbon nitride and carbon nitride films were deposited by ECR plasma-assisted CVD and rf reactive magnetron sputtering. Film composition(N/C ratio), growth rate (Vg) and microhardness bias in the range 0 to 200V. As was revealed, the ion bombardment influences the composition and growth rate of carbon nitride films during their deposition. Hydrogenated carbon nitride and carbon nitride films were deposited by ECR plasma-assisted CVD and rf reactive magnetron sputtering. Film composition(N/C ratio), growth rate (Vg) and microhardness bias in the range 0 to 200V. As was revealed, the ion bombardment influences the composition and growth rate of carbon nitride films during their deposition. (en)
Title	Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering. Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering. (en)
skos:prefLabel	Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering. Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering. (en)
skos:notation	RIV/68378271:_____/00:02010098!RIV/2003/AV0/A02003/N
http://linked.open.../vavai/riv/strany	261;267
http://linked.open...avai/riv/aktivita	P Z
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http://linked.open...iv/cisloPeriodika	N/A
http://linked.open...vai/riv/dodaniDat	2003
http://linked.open...aciTvurceVysledku	Soukup, Ladislav Jastrabík, Lubomír
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	708251
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/00:02010098
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	N/A (en)
http://linked.open.../riv/klicoveSlovo	N/A
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[754DE55DFA9F]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...vavai/riv/projekt	Processes in the unipolar RF hollow cathode discharge induced in the plasma reactor Physical fundamentals of modern technologies
http://linked.open...UplatneniVysledku	2000
http://linked.open...v/svazekPeriodika	123
http://linked.open...iv/tvurceVysledku	Jastrabík, Lubomír Soukup, Ladislav Shaginyan, L. R. Onoprienko, A. A.
http://linked.open...n/vavai/riv/zamer	Experimentální a teoretický výzkum kondenzovaných systémů s význačnými fyzikálními vlastnostmi
issn	0257-8972
number of pages	7 (xsd:int)

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